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Interface properties in fluorinated (100) and (111)Si/SiO2 MOSFETs
A. Balasiński, M.H. Tsai, L. Vishnubhotla, T.P. Ma, H.H. Tseng, P.J. TobinVolume:
22
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(93)90139-v
File:
PDF, 294 KB
english, 1993