Chemically amplified AZPN114 electron beam resist for...

Microelectronic Engineering 1995 Vol. 26; Iss. 2

Chemically amplified AZPN114 electron beam resist for advanced photomask fabrication

S.E. Huq, P.D. Prewett, P. Herman
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
26
Year:
1995
Language:
english
Pages:
11
DOI:
10.1016/0167-9317(94)00044-u
File:
PDF, 555 KB
english, 1995
Conversion to is in progress
Conversion to is failed