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Volume 26; Issue 2
Main
Microelectronic Engineering
Volume 26; Issue 2
Microelectronic Engineering
Volume 26; Issue 2
1
Superresolution lithography from the viewpoint of partially coherent imaging theory Part I: Line and space structures
R. Hild
,
G. Nitzsche
,
U. Altenburger
Journal:
Microelectronic Engineering
Year:
1995
Language:
english
File:
PDF, 1.09 MB
Your tags:
english, 1995
2
Superresolution lithography from the viewpoint of partially coherent imaging theory Part II: Isolated structures
R. Hild
,
G. Nitzsche
,
U. Altenburger
Journal:
Microelectronic Engineering
Year:
1995
Language:
english
File:
PDF, 764 KB
Your tags:
english, 1995
3
Chemically amplified AZPN114 electron beam resist for advanced photomask fabrication
S.E. Huq
,
P.D. Prewett
,
P. Herman
Journal:
Microelectronic Engineering
Year:
1995
Language:
english
File:
PDF, 555 KB
Your tags:
english, 1995
4
Shallow junction formation by phosphorus diffusion from in situ spike-doped chemical vapor deposited amorphous silicon
D. Krüger
,
J. Schlote
,
W. Röpke
,
R. Kurps
,
Ch. Quick
Journal:
Microelectronic Engineering
Year:
1995
Language:
english
File:
PDF, 601 KB
Your tags:
english, 1995
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