Interfacial reaction of nickel/hydrogenated amorphous...

Applied Surface Science 1989 Vol. 41-42; Iss. none

Interfacial reaction of nickel/hydrogenated amorphous silicon system at low temperature studied by fluorescence exafs

Yunosuke Kawadzu, Mitsuru Iloka, Americo Fujii, Hiroyuki Oyanagi, Toshihiro Arai
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
41-42
Year:
1989
Language:
english
Pages:
5
DOI:
10.1016/0169-4332(89)90074-3
File:
PDF, 436 KB
english, 1989
Conversion to is in progress
Conversion to is failed