Transportation of hydrogen radicals for cleaning extreme ultraviolet lithography optics
Kuroki, Yuya, Funakoshi, Naoto, Nishiyama, Iwao, Izumi, AkiraVolume:
575
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.10.030
Date:
January, 2015
File:
PDF, 450 KB
english, 2015