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Model for the radiation degradation of polycrystalline silicon films
Nakabayashi, M., Ohyama, H., Takakura, K., Simoen, E., Claeys, C.Volume:
50
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/TNS.2003.820634
Date:
December, 2003
File:
PDF, 638 KB
english, 2003