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Electron mobility enhancement in strained-Si n-MOSFETs fabricated on SiGe-on-insulator (SGOI) substrates
Zhi-Yuan Cheng,, Currie, M.T., Leitz, C.W., Taraschi, G., Fitzgerald, E.A., Hoyt, J.L., Antoniadas, D.A.Volume:
22
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.930678
Date:
July, 2001
File:
PDF, 129 KB
english, 2001