Electrical Characteristics of $\hbox{Al}_{2} \hbox{O}_{3}/\hbox{TiO}_{2}/\hbox{Al}_{2}\hbox{O}_{3}$ Nanolaminate MOS Capacitor on $p$-GaN With Post Metallization Annealing and $(\hbox{NH}_{4})_{2}\hbox{S}_{X}$ Treatments
Ko-Tao Lee,, Chih-Fang Huang,, Jeng Gong,, Bo-Heng Liou,Volume:
30
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2009.2026295
Date:
September, 2009
File:
PDF, 310 KB
english, 2009