Highly accelerated electromigration lifetime test (HALT) of...

IEEE Transactions on Device and Materials Reliability 2003 / 12 Vol. 3; Iss. 4

Highly accelerated electromigration lifetime test (HALT) of copper

Aubel, O., Hasse, W., Hommel, M.
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Volume:
3
Language:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/tdmr.2003.820055
Date:
December, 2003
File:
PDF, 512 KB
english, 2003
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