Investigation of Key Technologies for Poly-Si/TaN/HfLaON/IL...

IEEE Transactions on Electron Devices 2014 / 04 Vol. 61; Iss. 4

Investigation of Key Technologies for Poly-Si/TaN/HfLaON/IL ${\rm SiO}_{2}$ Gate-Stacks in Advanced Device Applications

Xu, Qiuxia, Xu, Gaobo, Li, Yongliang, Zhou, Huajie, Li, Junfeng, Niu, Jiebin, Ding, Mingzheng, Chen, Dapeng, Ye, Tianchun
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Volume:
61
Language:
english
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/ted.2014.2309145
Date:
April, 2014
File:
PDF, 3.79 MB
english, 2014
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