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Observation of Metal-Layer Stress on Si Nanowires in Gate-All-Around High- $\kappa$/Metal-Gate Device Structures
Singh, N., Fang, W.W., Rustagi, S.C., Budharaju, K.D., Teo, S.H.G., Mohanraj, S., Lo, G.Q., Balasubramanian, N., Kwong, D.-L.Volume:
28
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2007.899330
Date:
July, 2007
File:
PDF, 313 KB
english, 2007