On-Mask CD and Overlay Test Structures for Alternating...

IEEE Transactions on Semiconductor Manufacturing 2005 / 05 Vol. 18; Iss. 2

On-Mask CD and Overlay Test Structures for Alternating Aperture Phase Shift Lithography

Smith, S., McCallum, M., Walton, A.J., Stevenson, J.T.M., Harris, P.D., Ross, A.W.S., Hourd, A.C., Jiang, L.
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Volume:
18
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2005.845056
Date:
May, 2005
File:
PDF, 1.08 MB
english, 2005
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