Impact of boron penetration at P/sup +/-poly/gate oxide interface on deep-submicron device reliability for dual-gate CMOS technologies
Ming-Yin Hao,, Nayak, D., Rakkit, R.Volume:
18
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.568770
Date:
May, 1997
File:
PDF, 85 KB
english, 1997