Experimental determination of electron and hole mobilities in MOS accumulation layers
McKeon, J.B., Chindalore, G., Hareland, S.A., Shih, W.-K., Wang, C., Tasch, A.F., Maziar, C.M.Volume:
18
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.568762
Date:
May, 1997
File:
PDF, 80 KB
english, 1997