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Improvement in the aspect ratio of fabricated minute dots by the volume change thermal lithography technique
M. Kuwahara, J.H. Kim, P. Fons, J. TominagaVolume:
78-79
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2004.12.048
File:
PDF, 230 KB
english, 2005