Volume 78-79; Issue none

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Microelectronic Engineering
Volume 78-79; Issue none

Microelectronic Engineering

Volume 78-79; Issue none

1

Determining the impact of statistical fluctuations on resist line edge roughness

L.H.A. Leunissen, M. Ercken, G.P. Patsis

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 289 KB

english, 2005

2

Fabrication of refractive X-ray focusing lenses by deep X-ray lithography

F. Pérennès, M. Matteucci, W. Jark, B. Marmiroli

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 317 KB

english, 2005

3

Dry release of all-polymer structures

D. Haefliger, M. Nordström, P.A. Rasmussen, A. Boisen

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 246 KB

english, 2005

4

A systematic study of dry etch process for profile control of silicon tips

Jiarui Tao, Yifang Chen, Adnan Malik, Ling Wang, Xingzhong Zhao, Hongwei Li, Zheng Cui

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 195 KB

english, 2005

5

Novel resonant cantilever mass change detection and resonant frequency tuning

A.V. Grigorov, A. Boisen

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 182 KB

english, 2005

6

Ordered quantum dots formation on engineered template by molecular beam epitaxy

Suwaree Suraprapapich, Songphol Kanjanachuchai, Supachok Thainoi, Somsak Panyakeow

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 194 KB

english, 2005

7

Improvement in the aspect ratio of fabricated minute dots by the volume change thermal lithography technique

M. Kuwahara, J.H. Kim, P. Fons, J. Tominaga

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 230 KB

english, 2005

8

Artificially inscribed defects in opal photonic crystals

Fredrik Jonsson, Clivia M. Sotomayor Torres, Jörg Seekamp, Moritz Schniedergers, Anne Tiedemann, Jianhui Ye, Rudolf Zentel

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 980 KB

english, 2005

9

Growth and characterisation of birefringent films on textured silicon substrates

E.D. Walsby, M. Arnold, Q.-h. Wu, I.J. Hodgkinson, R.J. Blaikie

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 285 KB

english, 2005

10

Fabrication of two-dimensional hybrid photonic crystals utilizing electron beam lithography

J. Stodolka, D. Nau, M. Frommberger, C. Zanke, H. Giessen, E. Quandt

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 327 KB

english, 2005

11

Micromachining of organic polymers by X-ray photo-etching using a 10 Hz laser-plasma radiation source

A. Bartnik, H. Fiedorowicz, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, M. Szczurek

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 225 KB

english, 2005

12

Resist nano-modification technology for enhancing the lithography and etching performance

Hsin-Chiang You, Fu-Hsiang Ko, Tan-Fu Lei

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 262 KB

english, 2005

13

Simulation of the energy absorption and the resist development at sub-150 nm ion lithography

K. Vutova, G. Mladenov, T. Tanaka, K. Kawabata

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 187 KB

english, 2005

14

In situ bio-functionalization and cell adhesion in microfluidic devices

Z.L. Zhang, C. Crozatier, M. Le Berre, Y. Chen

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 364 KB

english, 2005

15

Towards a planar sample support for in situ experiments in structural biology

M.R. Gullo, T. Akiyama, P.L.T.M. Frederix, A. Tonin, U. Staufer, A. Engel, N.F. de Rooij

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 168 KB

english, 2005

16

Development of impedance biosensors with nanometer gaps for marker-free analytical measurements

A. Malavé, M. Tewes, T. Gronewold, M. Löhndorf

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 242 KB

english, 2005

17

Chemical patterning of sub-50-nm half pitches via nanoimprint lithography

Sunggook Park, Sina Saxer, Celestino Padeste, Harun H. Solak, Jens Gobrecht, Helmut Schift

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 303 KB

english, 2005

18

Critical dimension adapted alignment for EBDW

U. Weidenmueller, P. Hahmann, L. Pain, M. Jurdit, D. Henry, Y. Laplanche, S. Manakli, J. Todeschini

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 316 KB

english, 2005

19

Gas-assisted etching of niobium with focused ion beam

X.L. Fu, P.G. Li, A.Z. Jin, L.M. Chen, H.F. Yang, L.H. Li, W.H. Tang, Z. Cui

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 241 KB

english, 2005

20

Polymeric film characterization for use in bimorph chemical sensors

S. Chatzandroulis, D. Goustouridis, I. Raptis

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 299 KB

english, 2005

21

Distortion and overlay performance of UV step and repeat imprint lithography

Jin Choi, Kevin Nordquist, Ashuman Cherala, Lester Casoose, Kathy Gehoski, William J. Dauksher, S.V. Sreenivasan, Douglas J. Resnick

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 649 KB

english, 2005

22

A continuously tunable organic DFB laser

J. Wang, Th. Weimann, P. Hinze, G. Ade, D. Schneider, T. Rabe, T. Riedl, W. Kowalsky

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 176 KB

english, 2005

23

Enhanced dill exposure model for thick photoresist lithography

Shijie Liu, Jinglei Du, Xi Duan, Boliang Luo, Xionggui Tang, Yongkang Guo, Zheng Cui, Chunlei Du, Jun Yao

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 237 KB

english, 2005

24

Biological samples micro-manipulation by means of optical tweezers

E. Ferrari, V. Emiliani, D. Cojoc, V. Garbin, M. Zahid, C. Durieux, M. Coppey-Moisan, E. Di Fabrizio

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 253 KB

english, 2005

25

Development of the new thermal inkjet head on SOI wafer

Ki Deok Bae, Seog Soon Baek, Hyung Taek Lim, Keon Kuk, Kwang Choon Ro

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 343 KB

english, 2005

26

Three-dimensional simulation of resist pattern deformation by surface tension at the drying process

M. Kotera, N. Ochiai

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 303 KB

english, 2005

27

Preface

Pieter Kruit, Emile van der Drift

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 44 KB

english, 2005

28

Focused ion beam lithography for two dimensional array structures for photonic applications

S. Cabrini, A. Carpentiero, R. Kumar, L. Businaro, P. Candeloro, M. Prasciolu, A. Gosparini, C. Andreani, M. De Vittorio, T. Stomeo, E. Di Fabrizio

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 274 KB

english, 2005

29

Design aspects for the fabrication of gratings for DFB-lasers by direct write electron-beam lithography

R. Steingrüber, M. Möhrle

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 186 KB

english, 2005

30

Manufacturable MEMS microcolumn

R. Saini, Z. Jandric, K. Tsui, T. Udeshi, D. Tuggle

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 326 KB

english, 2005

31

Dry release fabrication and testing of SiC electrostatic cantilever actuators

Liudi Jiang, M. Hassan, R. Cheung, A.J. Harris, J.S. Burdess, C.A. Zorman, M. Mehregany

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 192 KB

english, 2005

32

Characterization of pneumatically activated microvalves by measuring electrical conductance

J.-C. Galas, V. Studer, Y. Chen

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 191 KB

english, 2005

33

Investigation of the bond strength between the photo-sensitive polymer SU-8 and gold

Maria Nordström, Alicia Johansson, Encarnacion Sánchez Noguerón, Bjarne Clausen, Montserrat Calleja, Anja Boisen

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 212 KB

english, 2005

34

Monolithically integrated micro flow sensor for lab-on-chip applications

L. Schöler, B. Lange, K. Seibel, H. Schäfer, M. Walder, N. Friedrich, D. Ehrhardt, F. Schönfeld, G. Zech, M. Böhm

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 381 KB

english, 2005

35

Design, fabrication and characterization of force sensors for nanorobot

K. Domanski, P. Janus, P. Grabiec, R. Perez, N. Chaillet, S. Fahlbusch, A. Sill, S. Fatikow

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 390 KB

english, 2005

36

A coupled cavity micro-fluidic dye ring laser

M. Gersborg-Hansen, S. Balslev, N.A. Mortensen, A. Kristensen

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 192 KB

english, 2005

37

Magnetic nanowires patterned in the La2/3Sr1/3MnO3 half-metal

T. Arnal, R. Soulimane, A. Aassime, M. Bibes, Ph. Lecoeur, A.M. Haghiri-Gosnet, B. Mercey, A.V. Khvalkovskii, A.K. Zvezdin, K.A. Zvezdin

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 223 KB

english, 2005

38

Electron beam lithography for nanometer-scale planar double-gate transistors

W. Weber, G. Ilicali, J. Kretz, L. Dreeskornfeld, W. Rösner, W. Hansch, L. Risch

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 640 KB

english, 2005

39

Photovoltaic In0.5Ga0.5As/GaAs quantum dot infrared photodetector with a single-sided Al0.3Ga0.7As layer

S.H. Hwang, J.C. Shin, J.D. Song, W.J. Choi, J.I. Lee, H. Han, S.-W. Lee

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 166 KB

english, 2005

40

A hybrid CMOS–SET co-fabrication platform using nano-grain polysilicon wires

S. Ecoffey, V. Pott, S. Mahapatra, D. Bouvet, P. Fazan, A.M. Ionescu

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 372 KB

english, 2005

41

A Si/SiGe MOSFET utilizing low-temperature wafer bonding

S. Koliopoulou, P. Dimitrakis, D. Goustouridis, S. Chatzandroulis, P. Normand, D. Tsoukalas, H. Radamson

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 242 KB

english, 2005

42

Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching

Seh-Won Ahn, Ki-Dong Lee, Jin-Sung Kim, Sang Hoon Kim, Sarng H. Lee, Joo-Do Park, Phil-Won Yoon

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 237 KB

english, 2005

43

Micro- and nanoxerography in liquids – controlling pattern definition

N. Naujoks, A. Stemmer

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 303 KB

english, 2005

44

A novel method for making high aspect ratio solid diamond tips

Zongli Wang, Changzhi Gu, Junjie Li, Zheng Cui

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 330 KB

english, 2005

45

Nanoscaled niobium trilayer technology, using temperature controlled pattern transfer

T. Zijlstra, M. Kroug, B. Rong, T.M. Klapwijk

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 185 KB

english, 2005

46

Building and testing submicrometer metallic (gold) air-bridges for nanotransport applications

T. Borzenko, V. Hock, D. Supp, C. Gould, G. Schmidt, L.W. Molenkamp

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 307 KB

english, 2005

47

Line end shortening in CPL mask technology

Will Conley, Jan Pieter Kuijten, Arjan Verhappen, Stefan van de Goor, Lloyd Litt, Wei Wu, Kevin Lucas, Bernie Roman, Bryan Kasprowicz, Chris Progler, Robert Socha, Doug van den Broeke, Kurt Wampler, T

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 259 KB

english, 2005

48

Roughness and damage of a GaAs surface after chemically assisted ion beam etching with Cl2/Ar+

J. Dienelt, K. Zimmer, J. von Sonntag, B. Rauschenbach, C. Bundesmann

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 303 KB

english, 2005

49

Increased plasma etch resistance of thin polymeric and photoresist films

N. Vourdas, A.G. Boudouvis, E. Gogolides

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 128 KB

english, 2005

50

Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20 nm MOSFET device demonstrators

J. Kretz, L. Dreeskornfeld, G. Ilicali, T. Lutz, W. Weber

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 275 KB

english, 2005

51

Correlation of surface roughness with edge roughness in PMMA resist

Shazia Yasin, M.N. Khalid, D.G. Hasko, S. Sarfraz

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 483 KB

english, 2005

52

Design of low Tg thermosets for short cycle time nanoimprint lithography

F. Reuther, M. Fink, M. Kubenz, C. Schuster, M. Vogler, G. Gruetzner

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 198 KB

english, 2005

53

A single layer negative tone lift-off photo resist for patterning a magnetron sputtered Ti/Pt/Au contact system and for solder bumps

A. Voigt, M. Heinrich, K. Hauck, R. Mientus, G. Gruetzner, M. Töpper, O. Ehrmann

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 317 KB

english, 2005

54

Simplified resist models for efficient simulation of contact holes and line ends

B. Tollkühn, A. Erdmann, A. Semmler, C. Nölscher

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 182 KB

english, 2005

55

Fabrication of hybrid organic–inorganic vertical microcavities through imprint technology

L. Martiradonna, M. De Vittorio, L. Troisi, M.T. Todaro, M. Mazzeo, T. Stomeo, M. Anni, R. Cingolani, G. Gigli

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 169 KB

english, 2005

56

Temperature-reduced nanoimprint lithography for thin and uniform residual layers

N. Bogdanski, M. Wissen, A. Ziegler, H.-C. Scheer

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 371 KB

english, 2005

57

Choice of the molecular weight of an imprint polymer for hot embossing lithography

H. Schulz, M. Wissen, N. Bogdanski, H.-C. Scheer, K. Mattes, Ch. Friedrich

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 379 KB

english, 2005

58

Fine pattern transfer by nanocasting lithography

Yoshihiko Hirai, Takashi Yoshikawa, Masatoshi Morimatsu, Masaki Nakajima, Hiroaki Kawata

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 452 KB

english, 2005

59

Nanoimprint lithography of sub-100 nm 3D structures

M. Konijn, M.M. Alkaisi, R.J. Blaikie

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 297 KB

english, 2005

60

Room temperature nanoimprint lithography using a bilayer of HSQ/PMMA resist stack

Jiarui Tao, Yifang Chen, Xingzhong Zhao, Adnan Malik, Zheng Cui

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 201 KB

english, 2005

61

A study of resist flow during nanoimprint lithography

D.S. Macintyre, S. Thoms

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 387 KB

english, 2005

62

Replication of sub-40 nm gap nanoelectrodes over an 8-in. substrate by nanoimprint lithography

J. Tallal, D. Peyrade, F. Lazzarino, K. Berton, C. Perret, M. Gordon, C. Gourgon, P. Schiavone

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 227 KB

english, 2005

63

Enhanced UV imprint ability with a tri-layer stamp configuration

E. Roy, Y. Kanamori, M. Belotti, Y. Chen

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 343 KB

english, 2005

64

Microfabricated textured surfaces for super-hydrophobicity investigations

Mathilde Callies, Yong Chen, Frédéric Marty, Anne Pépin, David Quéré

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 320 KB

english, 2005

65

Fabrication error model and near field beam modulation analysis for phase step diffractive gratings

Fuhua Gao, Ying Cheng, Xionggui Tang, Jun Yao, Chuankai Qiu, Yongkang Guo

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 154 KB

english, 2005

66

Selective deposition of gold nanoparticles on SiO2/Si nanowire

J.T. Sheu, C.C. Chen, P.C. Huang, M.L. Hsu

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 348 KB

english, 2005

67

Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructures

Tristan Bret, Ivo Utke, Patrik Hoffmann

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 357 KB

english, 2005

68

Maskless lithography

R. Fabian Pease

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 775 KB

english, 2005

69

Evaluation of intrinsic film stress distributions from induced substrate deformation

R.L. Engelstad, Z. Feng, E.G. Lovell, A.R. Mikkelson, J. Sohn

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 233 KB

english, 2005

70

Selective dry etch process for step and flash imprint lithography

Ngoc V. Le, William J. Dauksher, Kathy A. Gehoski, Douglas J. Resnick, A.E. Hooper, Steve Johnson, Grant Willson

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 612 KB

english, 2005

71

A disposable capillary electrophoresis microchip with an indium tin oxide decoupler/amperometric detector

Ju-Ho Kim, C.J. Kang, D. Jeon, Yong-Sang Kim

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 210 KB

english, 2005

72

Instrumented indentation testing for local characterisation of polymer properties after nanoimprint

G.L.W. Cross, B.S. O’Connell, J.B. Pethica, H. Schulz, H.-C. Scheer

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 428 KB

english, 2005

73

Fabrication of PDMS stamps for the patterned growth of carbon nanotubes

P. Argyrakis, L. Teo, T. Stevenson, R. Cheung

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 251 KB

english, 2005

74

Editorial board

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 31 KB

english, 2005

75

Editorial board

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 15 KB

english, 2005

76

Table of Contents

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 162 KB

english, 2005

77

Author Index

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 191 KB

english, 2005

78

A new and simple probe-based method for preventing charging in focused-ion-beam micro-sampling

Muneyuki Fukuda, Satoshi Tomimatsu, Hiroyasu Shichi, Kaoru Umemura

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 270 KB

english, 2005

79

UVIII for combined e-beam and optical exposure hybrid lithography

Shazia Yasin, M.N. Khalid, Y. Zhang, D.G. Hasko

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 114 KB

english, 2005

80

Topside release of atomic force microscopy probes with molded diamond tips

M. Fouchier, P. Eyben, G. Jamieson, W. Vandervorst

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 249 KB

english, 2005

81

Electrocapillary force actuation of microfluidic elements

M. Le Berre, Y. Chen, C. Crozatier, Z.L. Zhang

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 333 KB

english, 2005

82

Laser trapping and micro-manipulation using optical vortices

D. Cojoc, V. Garbin, E. Ferrari, L. Businaro, F. Romanato, E. Di Fabrizio

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 273 KB

english, 2005

83

Glass valveless micropump using electromagnetic actuation

Christophe Yamahata, Frédéric Lacharme, Martin A.M. Gijs

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 359 KB

english, 2005

84

Particle filters integrated inside a silicon wafer

W.J. Venstra, N.P. Pham, P.M. Sarro, J. van Eijk

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 188 KB

english, 2005

85

SnO2 sub-micron wires for gas sensors

P. Candeloro, A. Carpentiero, S. Cabrini, E. Di Fabrizio, E. Comini, C. Baratto, G. Faglia, G. Sberveglieri, A. Gerardino

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 297 KB

english, 2005

86

Highly selective etch process for silicon-on-insulator nano-devices

T. Wahlbrink, T. Mollenhauer, Y.M. Georgiev, W. Henschel, J.K. Efavi, H.D.B. Gottlob, M.C. Lemme, H. Kurz, J. Niehusmann, P. Haring Bolivar

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 184 KB

english, 2005

87

Fabrication of ultra-thin-film SOI transistors using the recessed channel concept

L. Dreeskornfeld, J. Hartwich, F. Hofmann, J. Kretz, E. Landgraf, R.J. Luyken, W. Rösner, R. Schröter, T. Schulz, M. Specht, M. Städele, W. Weber, L. Risch

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 266 KB

english, 2005

88

Surface mass spectrometric analysis of SiCl4/SiF4/O2 dry etch gate recessed 120 nm T-gate GaAs pHEMTs

X. Li, K. Elgaid, H. McLelland, I.G. Thayne

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 537 KB

english, 2005

89

Maskless fabrication of nanoelectrode structures with nanogaps by using Ga focused ion beams

Takashi Nagase, Kenji Gamo, Tohru Kubota, Shinro Mashiko

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 352 KB

english, 2005

90

Exploration of the ultimate patterning potential achievable with focused ion beams

J. Gierak, E. Bourhis, M.N. Mérat Combes, Y. Chriqui, I. Sagnes, D. Mailly, P. Hawkes, R. Jede, L. Bruchhaus, L. Bardotti, B. Prével, A. Hannour, P. Mélinon, A. Perez, J. Ferré, J.-P. Jamet, A. Mougin

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 532 KB

english, 2005

91

Antireflection sub-wavelength gratings fabricated by spin-coating replication

Y. Kanamori, E. Roy, Y. Chen

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 246 KB

english, 2005

92

New salicidation technology PtSi for strained SiGe device

B. Rong, T. Zijlstra, Y.T. Tang, A.G.R. Evans

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 128 KB

english, 2005

93

Adsorbed layer etching of fused silica by excimer laser with nanometer depth precision

K. Zimmer, R. Böhme, B. Rauschenbach

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 251 KB

english, 2005

94

Silicon nanowires fabricated by means of an underetching technique

S. Ciucci, F. D’Angelo, A. Diligenti, B. Pellegrini, G. Pennelli, M. Piotto

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 277 KB

english, 2005

95

A single-step process for making nanofluidic channels using electron beam lithography

J.L. Pearson, D.R.S. Cumming

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 228 KB

english, 2005

96

Rapid prototyping of two-dimensional photonic crystal devices by a dual beam focused ion beam system

T. Stomeo, G. Visimberga, M.T. Todaro, A. Passaseo, R. Cingolani, M. De Vittorio, S. Cabrini, A. Carpentiero, E. Di Fabrizio

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 213 KB

english, 2005

97

Fabrication of photonic crystals in tantalum pentoxide films

Uwe Huebner, R. Boucher, W. Morgenroth, J. Kunert, H. Roth, H.-G. Meyer, T. Glaser, S. Schroeter

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 442 KB

english, 2005

98

Optical activity in chiral gold nanogratings

K. Jefimovs, N. Saito, Yu. Ino, T. Vallius, P. Vahimaa, J. Turunen, R. Shimano, M. Kauranen, Yu. Svirko, M. Kuwata-Gonokami

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 252 KB

english, 2005

99

Silicon-containing copolymers of MMA tested for a positive-tone high-resolution bi-layer e-beam resist system

J. Maessen, S. van den Boogaart, E.J.K. Verstegen, J.G. Kloosterboer, F.C.M.J.M. van Delft, W. Catsburg, F.H.P.M. Habraken

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 271 KB

english, 2005

100

An ultra sensitive DNA detection by using gold nanoparticle multilayer in nano-gap electrodes

Chien-Ying Tsai, Tien-Li Chang, Chun-Chi Chen, Fu-Hsiang Ko, Ping-Hei Chen

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 525 KB

english, 2005

101

Nanofabrication of protein-patterned substrates for future cell adhesion experiments

P.A. Künzi, J. Lussi, L. Aeschimann, G. Danuser, M. Textor, N.F. de Rooij, U. Staufer

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 280 KB

english, 2005

102

Hybrid bendable stamp copies for molding fabricated by nanoimprint lithography

Helmut Schift, Sunggook Park, Jens Gobrecht, Fabian Meier, Werner Raupach, Konrad Vogelsang

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 349 KB

english, 2005

103

Nanoimprint lithography for planar chiral photonic meta-materials

Yifang Chen, Jiarui Tao, Xingzhong Zhao, Zheng Cui, Alexander S. Schwanecke, Nikolay I. Zheludev

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 395 KB

english, 2005

104

Production of structures for microfluidics using polymer imprint techniques

C.A. Mills, E. Martinez, F. Bessueille, G. Villanueva, J. Bausells, J. Samitier, A. Errachid

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 201 KB

english, 2005

105

New method to correct eddy current in magnetic focusing-deflection system

Zhuming Liu, Wenqi Gu

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 254 KB

english, 2005

106

The mechanism of the ion beam inhibited etching formation in Gallium-FIB implanted resist films

Khalil Arshak, Miroslav Mihov, Shohei Nakahara, Arous Arshak, Declan McDonagh

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 296 KB

english, 2005

107

Arrayed microcolumn operation with a wafer-scale Einzel lens

Ho-Seob Kim, Dae-Wook Kim, Seungjoon Ahn, Young Chul Kim, Jaewon Cho, Sang-Kook Choi, Dae-Yong Kim

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 275 KB

english, 2005

108

Single atom Si nanoelectronics using controlled single-ion implantation

M. Mitic, S.E. Andresen, C. Yang, T. Hopf, V. Chan, E. Gauja, F.E. Hudson, T.M. Buehler, R. Brenner, A.J. Ferguson, C.I. Pakes, S.M. Hearne, G. Tamanyan, D.J. Reilly, A.R. Hamilton, D.N. Jamieson, A.S

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 555 KB

english, 2005

109

Implication of the light polarisation for UV curing of pre-patterned resists

M. Wissen, N. Bogdanski, H.-C. Scheer, A. Bitz, G. Ahrens, G. Gruetzner

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 399 KB

english, 2005

110

Geometry dependence of the energy levels in silicon isolated double quantum-dots

M.G. Tanner, E.G. Emiroglu, D.G. Hasko, D.A. Williams

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 329 KB

english, 2005

111

Double-island single-electron transistor operated at radio-frequency for sensitive and fast charge detection

R. Brenner, T.M. Buehler, D.J. Reilly

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 257 KB

english, 2005

112

Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogaps

M.E. Anderson, Charan Srinivasan, Raviprakesh Jayaraman, P.S. Weiss, M.W. Horn

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 190 KB

english, 2005

113

Fabrication of patterned magnetic nanodots by laser interference lithography

R. Murillo, H.A. van Wolferen, L. Abelmann, J.C. Lodder

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 279 KB

english, 2005

114

Characterization of focused electron beam induced carbon deposits from organic precursors

Tristan Bret, Sebastien Mauron, Ivo Utke, Patrik Hoffmann

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 381 KB

english, 2005

115

Phase shifted addressing using a spatial light modulator

Ulric Ljungblad, Hans Martinsson, Torbjörn Sandström

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 277 KB

english, 2005

116

Space-invariant multiple-beam achromatic EUV interference lithography

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 374 KB

english, 2005

117

Novel electron beam resist material using hydrophilic protecting group

Satoshi Saito, Tetsuro Nakasugi

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 153 KB

english, 2005

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