Resist nano-modification technology for enhancing the...

Microelectronic Engineering 2005 Vol. 78-79; Iss. none

Resist nano-modification technology for enhancing the lithography and etching performance

Hsin-Chiang You, Fu-Hsiang Ko, Tan-Fu Lei
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Volume:
78-79
Year:
2005
Language:
english
Pages:
7
DOI:
10.1016/j.mee.2004.12.066
File:
PDF, 262 KB
english, 2005
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