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Simulation of the energy absorption and the resist development at sub-150 nm ion lithography
K. Vutova, G. Mladenov, T. Tanaka, K. KawabataVolume:
78-79
Year:
2005
Language:
english
Pages:
7
DOI:
10.1016/j.mee.2004.12.067
File:
PDF, 187 KB
english, 2005