Effective mobility in FinFET structures with HfO2 and SiON...

Effective mobility in FinFET structures with HfO2 and SiON gate dielectrics and TaN gate electrode

T. Rudenko, N. Collaert, S. De Gendt, V. Kilchytska, M. Jurczak, D. Flandre
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Volume:
80
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2005.04.026
File:
PDF, 156 KB
english, 2005
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