Adhesion improvement of ArF resist pattern depending on...

Microelectronic Engineering 2006 Vol. 83; Iss. 4-9

Adhesion improvement of ArF resist pattern depending on BARC material

Akira Kawai, Takahiro Moriuchi, Takayoshi Niiyama, Takahiro Kishioka, Daisuke Maruyama, Yasushi Sakaida, Takashi Matsumoto
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Volume:
83
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2005.12.030
File:
PDF, 163 KB
english, 2006
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