Volume 83; Issue 4-9

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Microelectronic Engineering
Volume 83; Issue 4-9

Microelectronic Engineering

Volume 83; Issue 4-9

1

Novel metrology methods for image quality control

Takeaki Ebihara, Yoshihiro Shiode, Takashi Yoshikawa, Naoki Ayata

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 572 KB

english, 2006

2

The ending of optical lithography and the prospects of its successors

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 644 KB

english, 2006

3

Protected nanoelectrodes of two different metals with 30 nm gapwidth and access window

S. Kronholz, S. Karthäuser, G. Mészáros, Th. Wandlowski, A. van der Hart, R. Waser

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 156 KB

english, 2006

4

Fabrication of two-dimensional photonic crystals with embedded defects using blue-laser-writer and holography

Tao Liu, Mahmoud Fallahi, Jerome V. Moloney, Masud Mansuripur

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 301 KB

english, 2006

5

Fabrication of SOI photonic crystal slabs by soft UV-nanoimprint lithography

Michele Belotti, Jérémi Torres, Emmanuel Roy, Anne Pépin, Dario Gerace, Lucio C. Andreani, Matteo Galli, Yong Chen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 502 KB

english, 2006

6

A study of 193-nm immersion lithography using novel high refractive index fluids

Julius Santillan, Akihiko Otoguro, Toshiro Itani, Kiyoshi Fujii, Akifumi Kagayama, Takashi Nakano, Norio Nakayama, Hiroaki Tamatani, Shin Fukuda

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 129 KB

english, 2006

7

Adhesion improvement of ArF resist pattern depending on BARC material

Akira Kawai, Takahiro Moriuchi, Takayoshi Niiyama, Takahiro Kishioka, Daisuke Maruyama, Yasushi Sakaida, Takashi Matsumoto

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 163 KB

english, 2006

8

The role of ambient hydrocarbon species to reduce oxidation in Ru capping layers for EUVL optics mirrors

Yoshio Gomei, Y. Kakutani, H. Takase, M. Niibe, S. Terashima, T. Aoki, S. Matsunari

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 173 KB

english, 2006

9

Exposing extreme ultraviolet lithography at Intel

Jeanette Roberts, Terence Bacuita, Robert L. Bristol, Heidi Cao, Manish Chandhok, Sang H. Lee, Michael Leeson, Ted Liang, Eric Panning, Bryan J. Rice, Uday Shah, Melissa Shell, Wang Yueh, Guojing Zhan

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 243 KB

english, 2006

10

Flying phase mask for the printing of long submicron-period stitchingless gratings

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J.-C. Pommier, O. Parriaux

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 206 KB

english, 2006

11

Limitations to low-voltage focused ion beam operation

Michael Rauscher, Karin Marianowski, Bernhard Degel, Erich Plies

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 194 KB

english, 2006

12

AFM characterization of anti-sticking layers used in nanoimprint

J. Tallal, M. Gordon, K. Berton, A.L. Charley, D. Peyrade

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 209 KB

english, 2006

13

Nanometre scale overlay and stitch metrology using an optical microscope

D.S. Macintyre, S. Thoms

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 150 KB

english, 2006

14

High-speed data storage and processing for projection mask-less lithography systems

Sven-Hendrik Voss, Maati Talmi, Juergen Saniter, Juergen Eindorf, Alexander Reisig, Joachim Heinitz, Ernst Haugeneder

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 142 KB

english, 2006

15

Critical failure ORC: Improving model accuracy through enhanced model generation

Amandine Borjon, Jérôme Belledent, Yorick Trouiller, Kyle Patterson, Kevin Lucas, Christian Gardin, Christophe Couderc, Yves Rody, Frank Sundermann, Jean-Christophe Urbani, Stanislas Baron, Frank Fous

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 1.32 MB

english, 2006

16

Electron-beam lithography simulation for the fabrication of EUV masks

George P. Patsis, Nikos Tsikrikas, Ioanis Raptis, Nikos Glezos

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 135 KB

english, 2006

17

Comparison of multilayer stamp concepts in UV–NIL

Ulrich Plachetka, Markus Bender, Andreas Fuchs, Thorsten Wahlbrink, Thomas Glinsner, Heinrich Kurz

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 325 KB

english, 2006

18

Multi-stacked MEMS nano-membranes for coherent extreme ultraviolet emission

Pavel Ustyuzhanin, Yisrael Sundick, Gil Geva-Mittelberg, Yashesh Shroff, Michael Goldstein

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 225 KB

english, 2006

19

Novel hybrid mask mold for combined nanoimprint and photolithography technique

Kanghun Moon, Banglim Choi, In-Sung Park, Sunghun Hong, Kihyun Yang, Heon Lee, Jinho Ahn

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 278 KB

english, 2006

20

Fabrication of micro-photonic devices using embossing technique

C.H. Choi, M.W. Lee, B.H. O, S.G. Lee, S.G. Park, E.H. Lee

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 187 KB

english, 2006

21

Micro-fluidic analysis based on total internal light reflection

Y. Sarov, K. Ivanova, Tzv. Ivanov, B.E. Volland, I.W. Rangelow

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 197 KB

english, 2006

22

Simulation of DOE fabrication using DMD-based gray-tone lithography

Xiaowei Guo, Jinglei Du, Yongkang Guo, Chunlei Du, Zheng Cui, Jun Yao

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 209 KB

english, 2006

23

Design and fabrication of an electrostatically driven microgripper for blood vessel manipulation

R. Wierzbicki, K. Houston, H. Heerlein, W. Barth, T. Debski, A. Eisinberg, A. Menciassi, M.C. Carrozza, P. Dario

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 170 KB

english, 2006

24

Surface structuring of textile fibers using roll embossing

Helmut Schift, Marcel Halbeisen, Urs Schütz, Benjamin Delahoche, Konrad Vogelsang, Jens Gobrecht

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 242 KB

english, 2006

25

A fast development simulation algorithm for discrete resist models

Thomas Schnattinger, Eberhard Bär, Andreas Erdmann

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 267 KB

english, 2006

26

Design and analysis of phase gratings for laser beams coherent combination

Boliang Luo, Chengcheng Wang, Jinglei Du, Chi Ma, Yongkang Guo, Jun Yao

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 244 KB

english, 2006

27

Microfabrication and properties of the meta-materials

Baogang Quan, Xinlong Xu, Xiaoxiang Xia, Haifang Yang, Li Wang, Zheng Cui, Changzhi Gu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 186 KB

english, 2006

28

Interface-engineered EUV multilayer mirrors

Sergiy Yulin, Nicolas Benoit, Torsten Feigl, Norbert Kaiser

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 239 KB

english, 2006

29

Benchmark of a lithography simulation tool for next generation applications

B. Tollkühn, M. Uhle, J. Fuhrmann, K. Gärtner, A. Heubner, A. Erdmann

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 332 KB

english, 2006

30

Response of super-paramagnetic beads in microfluidic devices with integrated magnetic micro-columns

S.S. Guo, C.C. Zuo, W.H. Huang, C. Peroz, Y. Chen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 558 KB

english, 2006

31

Characterization of extreme ultraviolet resists with interference lithography

Roel Gronheid, Harun H. Solak, Yasin Ekinci, Amandine Jouve, Frieda Van Roey

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 248 KB

english, 2006

32

Surface relief polymer structures grafted onto polymer films

Celestino Padeste, Patrick Farquet, Harun H. Solak

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 214 KB

english, 2006

33

One nanometer structure fabrication using electron beam induced deposition

W.F. van Dorp, C.W. Hagen, P.A. Crozier, B. van Someren, P. Kruit

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 159 KB

english, 2006

34

Nanoscale TiN metal gate technology for CMOS integration

M.C. Lemme, J.K. Efavi, T. Mollenhauer, M. Schmidt, H.D.B. Gottlob, T. Wahlbrink, H. Kurz

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 260 KB

english, 2006

35

Single-molecule transistor fabrication by self-aligned lithography and in situ molecular assembly

J. Tang, E.P. De Poortere, J.E. Klare, C. Nuckolls, S.J. Wind

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 169 KB

english, 2006

36

Manufacture of micro-sensors and actuators for flow control

G.G. Arthur, B.J. McKeon, S.S. Dearing, J.F. Morrison, Z. Cui

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 263 KB

english, 2006

37

UV sensing using surface acoustic wave device on DC sputtered ZnO monolayer

Leo P. Schuler, Maan M. Alkaisi, Paul Miller, Roger J. Reeves

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 318 KB

english, 2006

38

Modeling reaction-transport processes in a microcapillary biosensor for detection of human IgG

Michal Přibyl, Veronika Knápková, Dalimil Šnita, Miloš Marek

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 224 KB

english, 2006

39

Spin-polarized edge states of quantum Hall systems on silicon basis

Carsten Kentsch, Wolfgang Henschel, David Wharam, Dieter P. Kern

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 488 KB

english, 2006

40

Nanoelectrode arrays for on-chip manipulation of biomolecules in aqueous solutions

Cheng-Ping Luo, Andreas Heeren, Wolfgang Henschel, Dieter P. Kern

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 432 KB

english, 2006

41

Self-assembled lateral InAs quantum dot molecules: Dot ensemble control and polarization-dependent photoluminescence

S. Suraprapapich, S. Kanjanachuchai, S. Thainoi, S. Panyakeow

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 245 KB

english, 2006

42

Self-organization of nano-void array for photonic crystal device

Eiji Toratani, Masanao Kamata, Minoru Obara

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 180 KB

english, 2006

43

Molecular motors-based micro- and nano-biocomputation devices

Dan V. Nicolau, Dan V. Nicolau Jr., Gerardin Solana, Kristi L. Hanson, Luisa Filipponi, Lisen Wang, Abraham P. Lee

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 569 KB

english, 2006

44

Scanning proximity probes for nanoscience and nanofabrication

Ivo W. Rangelow

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 515 KB

english, 2006

45

Study on LIDT of MDGs for different fabrication processes

Weijin Kong, Shijie Liu, Jian Shen, Zicai Shen, Jianda Shao, Zhengxiu Fan, Jun Yao

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 419 KB

english, 2006

46

A high performance microfluidic system integrated with the micropump and microvalve on the same substrate

Jong-Chul Yoo, Min-Chul Moon, Y.J. Choi, C.J. Kang, Yong-Sang Kim

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 194 KB

english, 2006

47

Fabrication of actuator for nanopositioning using laser micro-machining

V. Lendraitis, M. Brikas, V. Snitka, V. Mizarienė, G. Raciukaitis

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 211 KB

english, 2006

48

Metal printing of copper interconnects down to 500 nm using ECPR – Electrochemical pattern replication

P. Möller, M. Fredenberg, M. Dainese, C. Aronsson, P. Leisner, M. Östling

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 1.63 MB

english, 2006

49

Fabrication and characterisation of nanoscale programmed defects for EUV lithography

Raluca Tiron, Celine De Nadaï, Christophe Constancias, Jean-Yves Robic, Jean-Philippe Gouy

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 193 KB

english, 2006

50

Design and fabrication of active and passive photonic crystal resonators

T. Stomeo, V. Errico, A. Salhi, A. Passaseo, R. Cingolani, A. D’Orazio, M. De Sario, V. Marrocco, V. Petruzzelli, F. Prudenzano, M. De Vittorio

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 190 KB

english, 2006

51

Arbitrarily profiled 3D polymer MEMS through Si micro-moulding and bulk micromachining

Michael P. Larsson

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 386 KB

english, 2006

52

Fabrication of curved-line nanostructures on membranes for transmission electron microscopy investigations of domain walls

D. Backes, L.J. Heyderman, C. David, R. Schäublin, M. Kläui, H. Ehrke, U. Rüdiger, C.A.F. Vaz, J.A.C. Bland, T. Kasama, R.E. Dunin-Borkowski

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 594 KB

english, 2006

53

Thickness-dependent glass transition temperature of thin resist films for high resolution lithography

S. Marceau, J.-H. Tortai, J. Tillier, N. Vourdas, E. Gogolides, I. Raptis, K. Beltsios, K. van Werden

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 509 KB

english, 2006

54

Vertical integrated-gate CMOS for ultra-dense IC

Yijian Chen, Albert Chu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 416 KB

english, 2006

55

Strategies for integration of donor electron spin qubits in silicon

T. Schenkel, J.A. Liddle, J. Bokor, A. Persaud, S.J. Park, J. Shangkuan, C.C. Lo, S. Kwon, S.A. Lyon, A.M. Tyryshkin, I.W. Rangelow, Y. Sarov, D.H. Schneider, J. Ager, R. de Sousa

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 241 KB

english, 2006

56

Practical development and implementation of 193 nm immersion lithography

Martin McCallum, Masaomi Kameyama, Soichi Owa

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 117 KB

english, 2006

57

Three dimensional HSQ structures formed using multiple low energy electron beam lithography

Euan J. Boyd, Richard J. Blaikie

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 456 KB

english, 2006

58

GaN nanorod assemblies on self-implanted (1 1 1) Si substrates

H.W. Seo, Q.Y. Chen, L.W. Tu, M. Chen, X.M. Wang, C.L. Hsiao, Y.J. Tu, L. Shao, O. Lozano, Wei-Kan Chu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 305 KB

english, 2006

59

Compact micropumping system based on LIGA fabricated microparts

M. Matteucci, F. Pérennès, B. Marmiroli, P. Miotti, L. Vaccari, A. Gosparini, A. Turchet, E. Di Fabrizio

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 168 KB

english, 2006

60

MNE 2005 Committees

Journal:

Microelectronic Engineering

Year:

2006

File:

PDF, 39 KB

2006

61

Fabrication and integration of VLSI micro/nano-photonic circuit board

El-Hang Lee, S.G. Lee, B.H. O, S.G. Park, M.Y. Chung, K.H. Kim, S.H. Song

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 363 KB

english, 2006

62

Cost of ownership – projecting the future

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 399 KB

english, 2006

63

Analysis of works of art down to the nanometric scale

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 583 KB

english, 2006

64

Polyimide sacrificial layer for SOI SG-MOSFET pressure sensor

M. Fernández-Bolaños, N. Abelé, V. Pott, D. Bouvet, G-A. Racine, J.M. Quero, A.M. Ionescu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 366 KB

english, 2006

65

Three-dimensional rotor fabrication by focused-ion-beam chemical-vapor-deposition

Jun-ya Igaki, Reo Kometani, Ken-ichiro Nakamatsu, Kazuhiro Kanda, Yuichi Haruyama, Yukinori Ochiai, Jun-ichi Fujita, Takashi Kaito, Shinji Matsui

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 421 KB

english, 2006

66

Removal mechanism of nano-bubble with AFM for immersion lithography

Akira Kawai, Kenta Suzuki

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 245 KB

english, 2006

67

Resonantly enhanced addressing of a spatial light modulator micro-mirror array

Ulric Ljungblad, Tomas Lock, Tor Sandstrom

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 205 KB

english, 2006

68

EUV multilayer optics

Torsten Feigl, Sergiy Yulin, Nicolas Benoit, Norbert Kaiser

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 250 KB

english, 2006

69

Performance of gas jet type Z-pinch plasma light source for EUV lithography

Inho Song, Yasunori Kobayashi, Toshiro Sakamoto, Smruti R. Mohanty, Masato Watanabe, Akitoshi Okino, Toru Kawamura, Koichi Yasuoka, Kazuhiko Horioka, Eiki Hotta

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 168 KB

english, 2006

70

Possibility to form an ultrahigh packed fine pit and dot arrays for future storage using EB writing

Sumio Hosaka, Hirotaka Sano, Kazuo Itoh, Hayato Sone

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 436 KB

english, 2006

71

Surface morphologies in polymers by irradiation with argon ions and consecutive swelling

Karsten Büscher, Rüdiger Berger, Wilhelm Brünger, Karlheinz Graf

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 233 KB

english, 2006

72

Patterning nanoscale features using the 2-step NERIME nanolithography process

S.F. Gilmartin, K. Arshak, D. Collins, O. Korostynska, A. Arshak

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 259 KB

english, 2006

73

Characterization of imprinting polymeric temperature variation with fluorescent Rhodamine B molecule

Fu-Hsiang Ko, Li-Yu Weng, Chu-Jung Ko, Tieh-Chi Chu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 194 KB

english, 2006

74

Viscous flow simulation in nanoimprint using coarse-grain method

V. Sirotkin, A. Svintsov, S. Zaitsev, H. Schift

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 474 KB

english, 2006

75

Superhydrophobic surfaces fabricated by nanoimprint lithography

Alessandro Pozzato, Simone Dal Zilio, Giovanni Fois, Diego Vendramin, Giampaolo Mistura, Michele Belotti, Yong Chen, Marco Natali

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 300 KB

english, 2006

76

A new mask blank deposition tool

J. Dienelt, H. Neumann, M. Kramer, F. Scholze, B. Rauschenbach, M. Nestler, A. Tarraf, M. Schulze

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 664 KB

english, 2006

77

Linear optical encoders manufactured by imprint lithography

S. Merino, A. Retolaza, I. Lizuain

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 361 KB

english, 2006

78

Lossless high-speed data compression for optical interconnects as used in maskless lithography systems

Sven-Hendrik Voss, Maati Talmi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 140 KB

english, 2006

79

Extended bidirectional reflectance distribution function for subsurface defects scattering

Jian Shen, Shijie Liu, Weijin Kong, Zicai Shen, Jianda Shao, Jun Yao

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 399 KB

english, 2006

80

Miniaturized electron gun for high-resolution scanning electron microscope using non-evaporable getter pumps

Souichi Katagiri, Takashi Ohshima

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 374 KB

english, 2006

81

Development of new resist materials for 193-nm dry and immersion lithography

Yoko Takebe, Takashi Sasaki, Naoko Shirota, Osamu Yokokoji

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 104 KB

english, 2006

82

Performance of molecular resist based on polyphenol in EUV lithography

Hiroaki Oizumi, Fumiaki Kumasaka, Yuusuke Tanaka, Taku Hirayama, Daiju Shiono, Hideo Hada, Junichi Onodera, Atsuko Yamaguchi, Iwao Nishiyama

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 511 KB

english, 2006

83

Fabricating and characterizing oblique polymer structures by electron beam writing on resist-coated SiO2 wafers

Fu-Hsiang Ko, Jem-Kun Chen, Feng-Chih Chang

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 318 KB

english, 2006

84

Reactive ion etching of glass for biochip applications: Composition effects and surface damages

Edouard Thiénot, Florian Domingo, Edmond Cambril, Charlie Gosse

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 265 KB

english, 2006

85

Aspect ratio dependent plasma polymer deposition of fluorocarbons

B.E. Volland, I.W. Rangelow

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 133 KB

english, 2006

86

Deeply etched waveguide structures for quantum cascade lasers

S. Schartner, S. Golka, C. Pflügl, W. Schrenk, G. Strasser

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 224 KB

english, 2006

87

Nanoscopic versus macroscopic C–V characterization of high-κ metal-oxide chemical vapor deposition ZrO2 thin films

S. Abermann, W. Brezna, J. Smoliner, E. Bertagnolli

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 200 KB

english, 2006

88

Minimization of residual layer thickness by using the optimized dispensing method in S-FILTM process

Ki-don Kim, Jun-ho Jeong, Young-suk Sim, Eung-sug Lee

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 264 KB

english, 2006

89

Effects of model polymer chain architectures and molecular weight of conventional and chemically amplified photoresists on line-edge roughness. Stochastic simulations

George P. Patsis, Evangelos Gogolides

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 357 KB

english, 2006

90

Near field analysis for periodic diffractive gratings using Fourier modal method

Fuhua Gao, Chengcheng Wang, Xionggui Tang, Chi Ma, Zheng Cui, Yongkang Guo

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 562 KB

english, 2006

91

Fabrication of a tensile test for polymer micromechanics

Udo Lang, Marcel Reichen, Jürg Dual

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 331 KB

english, 2006

92

Low surface energy films for microgripping applications

N. Balabanava, R. Wierzbicki, H. Heerlein, M. Zielecka, Z. Rymuza

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 244 KB

english, 2006

93

Microphotoluminescence perpendicular to the growth direction of quantum nanostructures

Ian Toft, Xiulai Xu, David Williams, R.T. Phillips

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 237 KB

english, 2006

94

Nanofabrication of Fresnel zone plate lenses for X-ray optics

Joan Vila-Comamala, Xavier Borrisé, Francesc Pérez-Murano, Juan Campos, Salvador Ferrer

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 630 KB

english, 2006

95

Laser micro machining of 3C–SiC single crystals

Sandra Zoppel, Maria Farsari, Robert Merz, Johann Zehetner, Günther Stangl, Georg A. Reider, Costas Fotakis

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 135 KB

english, 2006

96

Free-standing macroporous silicon membranes over a large cavity for filtering and lab-on-chip applications

Dimitrios N. Pagonis, Androula G. Nassiopoulou

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 509 KB

english, 2006

97

X-ray vortices with high topological charge

D. Cojoc, B. Kaulich, A. Carpentiero, S. Cabrini, L. Businaro, E. Di Fabrizio

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 778 KB

english, 2006

98

Fabrication of high power RF MEMS switches

Ling Wang, Zheng Cui, Jia-Sheng Hong, Eamon P. McErlean, Robert B. Greed, Daniel C. Voyce

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 190 KB

english, 2006

99

Effect of filler behavior on nanocomposite SU8 photoresist for moving micro-parts

S. Jiguet, M. Judelewicz, S. Mischler, A. Bertch, P. Renaud

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 345 KB

english, 2006

100

Deep etching of biocompatible silicone rubber

Dariusz Szmigiel, Krzysztof Domański, Piotr Prokaryn, Piotr Grabiec

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 241 KB

english, 2006

101

Resist parameter sensitivity analysis based on calibrated simulation for understanding resist limitations in next generation lithography

K. Elian, B. Ruppenstein, C. Noelscher, A. Heubner, T. Muelders

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 223 KB

english, 2006

102

30 nm Tungsten gates etched by a low damage ICP etching for the fabrication of compound semiconductor transistors

X. Li, X. Cao, H. Zhou, C.D.W. Wilkinson, S. Thoms, D. Macintyre, M. Holland, I.G. Thayne

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 288 KB

english, 2006

103

A low damage RIE process for the fabrication of compound semiconductor based transistors with sub-100 nm tungsten gates

X. Li, X. Cao, H. Zhou, C.D.W. Wilkinson, S. Thoms, D. Macintyre, M. Holland, I.G. Thayne

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 126 KB

english, 2006

104

Nano-imprint lithography: Templates, imprinting and wafer pattern transfer

W.J. Dauksher, N.V. Le, E.S. Ainley, K.J. Nordquist, K.A. Gehoski, S.R. Young, J.H. Baker, D. Convey, P.S. Mangat

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 317 KB

english, 2006

105

EUV resist simulation with rigorous mask computation and simplified resist models

A. Jouve, D. Fuard, V. Farys

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 143 KB

english, 2006

106

Fabrication of silicon vertical taper structures using KOH anisotropic etching

Roman Holly, Kurt Hingerl

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 220 KB

english, 2006

107

Silicon etch process options for micro- and nanotechnology using inductively coupled plasmas

C.C. Welch, A.L. Goodyear, T. Wahlbrink, M.C. Lemme, T. Mollenhauer

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 455 KB

english, 2006

108

Reactive oxide micro-molding of thick lenses containing diffractive optical elements

V.K. Parashar, A. Sayah, J.-B. Orhan, M.A.M. Gijs

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 185 KB

english, 2006

109

Characteristics of MOS diodes fabricated using sputter-deposited W or Cu/W films

Spiros Tsevas, Maria Vasilopoulou, Dimitrios N. Kouvatsos, Thanassis Speliotis, Dimitris Niarchos

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 221 KB

english, 2006

110

Projection lithography onto overall cylindrical surfaces

Kohei Hashimoto, Yoshihisa Kaneko, Toshiyuki Horiuchi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 324 KB

english, 2006

111

Micro-gear fabrication using optical projection lithography on copper-clad plastic substrates and electroplating of nickel

Toshiyuki Horiuchi, Yusuke Furuuchi, Ryota Nakamura, Katsunori Hirota

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 403 KB

english, 2006

112

Development of perfect silicon corrugated diaphragm using anisotropic etching

Norhayati Soin, B.Y. Majlis

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 163 KB

english, 2006

113

PDMS microfluidic chip with integrated waveguides for optical detection

Markus Fleger, Andreas Neyer

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 178 KB

english, 2006

114

Filling of nano-via holes by laser-assisted direct imprint

Bo Cui, Wei Wu, Chris Keimel, Stephen Y. Chou

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 147 KB

english, 2006

115

Focused ion beam induced nanodot and nanofiber growth

C. Schoendorfer, A. Lugstein, E. Bertagnolli

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 334 KB

english, 2006

116

Nano-line width control and standards using Lateral Pattern Definition technique

Michał Zaborowski, Dariusz Szmigiel, Teodor Gotszalk, Katerina Ivanova, Yanko Sarov, Tzvetan Ivanov, Burkhard E. Volland, Ivo W. Rangelow, Piotr Grabiec

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 280 KB

english, 2006

117

Self-aligned tantalum oxide nanodot arrays through anodic alumina template

Chia-Tien Wu, Fu-Hsiang Ko, Hsin-Yen Hwang

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 483 KB

english, 2006

118

Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure

H.L. Chen, S.Y. Chuang, H.C. Cheng, C.H. Lin, T.C. Chu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 191 KB

english, 2006

119

Multi-layered resist process in nanoimprint lithography for high aspect ratio pattern

Takaaki Konishi, Hisao Kikuta, Hiroaki Kawata, Yoshihiko Hirai

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 591 KB

english, 2006

120

Low energy electron beam microcolumn lithography

Ho Seob Kim, Young Chul Kim, Dae-Wook Kim, Seung Joon Ahn, Yong Jang, Hyung Woo Kim, Do Jin Seong, Kyoung Wan Park, Seong Soon Park, Byung Jin Kim

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 729 KB

english, 2006

121

Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography

Jun Taniguchi, Kentaro Koga, Yasuo Kogo, Iwao Miyamoto

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 566 KB

english, 2006

122

Fabrication of high frequency and low-cost surface-acoustic wave filters using near field phase shift photolithography

Fu-Der Lai, H.M. Huang

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 242 KB

english, 2006

123

A novel MOEMS based adaptive optics for X-ray focusing

M.Y. Al Aioubi, P.D. Prewett, S.E. Huq, V. Djakov, A.G. Michette

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 338 KB

english, 2006

124

Self organized InAs quantum dots grown on patterned GaAs substrates

Matthias Schramboeck, W. Schrenk, T. Roch, A.M. Andrews, M. Austerer, G. Strasser

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 235 KB

english, 2006

125

S-layer-streptavidin fusion proteins and S-layer-specific heteropolysaccharides as part of a biomolecular construction kit for application in nanobiotechnology

Carina Huber, Eva M. Egelseer, Nicola Ilk, Uwe B. Sleytr, Margit Sára

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 226 KB

english, 2006

126

Porous silicon as drug carrier for controlled delivery of doxorubicin anticancer agent

Lisa Vaccari, Davide Canton, Nadia Zaffaroni, Raffaella Villa, Massimo Tormen, Enzo di Fabrizio

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 211 KB

english, 2006

127

Ordered SiGe islands on vicinal and pre-patterned Si(0 0 1) substrates

Z. Zhong, H. Lichtenberger, G. Chen, M. Mühlberger, C. Schelling, J. Myslivecek, A. Halilovic, J. Stangl, G. Bauer, W. Jantsch, F. Schäffler

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 473 KB

english, 2006

128

Conduction in ultra-thin SOI nanowires prototyped by FIB milling

Vincent Pott, Adrian M. Ionescu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 215 KB

english, 2006

129

Fabrication of a 2.5 Gbps × 4 channel optical micro-module for O-PCB application

Hyun-Shik Lee, Shinmo An, Young Kim, Do-Kyoon Kim, Jin-Ku Kang, Young-Wan Choi, Seung Gol Lee, Beom Hoan O, El-Hang Lee

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 293 KB

english, 2006

130

EUV phase mask engineering based on image optimisation

A.M. Nugrowati, A.S. van de Nes, S.F. Pereira, J.J.M. Braat

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 174 KB

english, 2006

131

Front- to back-side overlay optimization after wafer bonding for 3D integration

Laurent Marinier, Wibo van Noort, Rudy Pellens, Budiman Sutedja, Ronald Dekker, Henk van Zeijl

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 570 KB

english, 2006

132

Directional scrolling of hetero-films on Si(1 1 0) and Si(1 1 1) surfaces

L. Zhang, E. Deckardt, A. Weber, C. Schönenberger, D. Grützmacher

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 205 KB

english, 2006

133

Investigation of FIB assisted CoSi2 nanowire growth

L. Bischoff, B. Schmidt, Ch. Akhmadaliev, A. Mücklich

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 284 KB

english, 2006

134

Mechanical characteristics of tungsten-containing carbon nanosprings grown by FIB-CVD

K. Nakamatsu, J. Igaki, M. Nagase, T. Ichihashi, S. Matsui

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 152 KB

english, 2006

135

Fabrication-induced disorder in structures for nanophotonics

Zoran Jakšić, Milan Maksimović, Olga Jakšić, Dana Vasiljević-Radović, Zoran Djurić, Aleksandar Vujanić

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 645 KB

english, 2006

136

Optical characterization of two-dimensional photonic crystals based on spectroscopic ellipsometry with rigorous coupled-wave analysis

Chun-Hung Lin, Hsuen-Li Chen, Wen-Chi Chao, Chung-I Hsieh, Wen-Huei Chang

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 620 KB

english, 2006

137

Simulation of ion beam direct structuring for 3D nanoimprint template fabrication

E. Platzgummer, A. Biedermann, H. Langfischer, S. Eder-Kapl, M. Kuemmel, S. Cernusca, H. Loeschner, C. Lehrer, L. Frey, A. Lugstein, E. Bertagnolli

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 564 KB

english, 2006

138

Progress in gene assembly from a MAS-driven DNA microarray

C. Kim, J. Kaysen, K. Richmond, M. Rodesch, B. Binkowski, L. Chu, M. Li, K. Heinrich, S. Blair, P. Belshaw, M. Sussman, F. Cerrina

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 231 KB

english, 2006

139

Silicon single-electron transistor fabricated by anisotropic etch and oxidation

G. Pennelli, M. Piotto, G. Barillaro

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 285 KB

english, 2006

140

High-density silicon nanowire growth from self-assembled Au nanoparticles

J. Albuschies, M. Baus, O. Winkler, B. Hadam, B. Spangenberg, H. Kurz

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 576 KB

english, 2006

141

Electron range effects in focused electron beam induced deposition of 3D nanostructures

Tristan Bret, Ivo Utke, Patrik Hoffmann, Maurice Abourida, Pascal Doppelt

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 395 KB

english, 2006

142

Applications of nano-patterning to tissue engineering

N. Gadegaard, E. Martines, M.O. Riehle, K. Seunarine, C.D.W. Wilkinson

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 327 KB

english, 2006

143

Molecular detection in a micro channel using silver-oxide thin film

Makoto Fujimaki, Yasuhiko Iwanabe, Koichi Awazu, Junji Tominaga

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 354 KB

english, 2006

144

A novel optical gas sensor based on sputtered InxOyNz films with gold-nano-dots

H. Steffes, A. Schleunitz, U. Gernert, R. Chabicovsky, E. Obermeier

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 311 KB

english, 2006

145

Layer-by-layer UV micromachining methodology of epoxy resist embedded microchannels

M. Kitsara, M. Chatzichristidi, D. Niakoula, D. Goustouridis, K. Beltsios, P. Argitis, I. Raptis

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 339 KB

english, 2006

146

Double line shrink lithography at k1 = 0.16

Christoph Noelscher, Marcel Heller, Boris Habets, Matthias Markert, Uli Scheler, Peter Moll

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 351 KB

english, 2006

147

Reproducible formation of nanoscale-gap electrodes for single-molecule measurements by combination of FIB deposition and tunneling current detection

K. Shigeto, M. Kawamura, A.Yu. Kasumov, K. Tsukagoshi, K. Kono, Y. Aoyagi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 148 KB

english, 2006

148

Effects of developing conditions on the contrast and sensitivity of hydrogen silsesquioxane

Yifang Chen, Haifang Yang, Zheng Cui

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 278 KB

english, 2006

149

Investigating 248 and 193 nm resist degradation during reactive ion oxide etching

Michael J. May, Bénédicte Mortini, Michel Heitzmann, Pauline Gautier, Claire Sourd, Cyril Brochon, Georges Hadziioannou

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 651 KB

english, 2006

150

Micro powder injection moulding

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 210 KB

english, 2006

151

Coulomb blockade in a nanoscale phosphorus-in-silicon island

F.E. Hudson, A.J. Ferguson, C. Yang, D.N. Jamieson, A.S. Dzurak, R.G. Clark

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 279 KB

english, 2006

152

Micro/nanomechanical resonators for distributed mass sensing with capacitive detection

Julien Arcamone, Gemma Rius, Gabriel Abadal, Jordi Teva, Nuria Barniol, Francesc Pérez-Murano

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 257 KB

english, 2006

153

New approach to micro-joining by hot gas stream

Daniela Andrijasevic, Ioanna Giouroudi, Walter Smetana, Stefan Boehm, Johann Zehetner, Werner Brenner

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 181 KB

english, 2006

154

A fabrication process for a silicon tunnel barrier with self-aligned gate

G. Pennelli, M. Piotto

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 196 KB

english, 2006

155

Monolithic silicon optoelectronic transducers and elastomeric fluidic modules for bio-spotting and bio-assay experiments

K. Misiakos, P.S. Petrou, S.E. Kakabakos, M.E. Vlahopoulou, A. Tserepi, E. Gogolides, H.H. Ruf

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 218 KB

english, 2006

156

Exposure optimization in high-resolution e-beam lithography

Peter Hudek, Dirk Beyer

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 235 KB

english, 2006

157

Diffusion along microfluidic channels

A. Heeren, C.P. Luo, G. Roth, A. Ganser, R. Brock, K.-H. Wiesmueller, W. Henschel, D.P. Kern

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 171 KB

english, 2006

158

Development of micro-stereolithography technology using metal powder

Jin Woo Lee, In Hwan Lee, Dong-Woo Cho

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 270 KB

english, 2006

159

Nano-patterning using an embedded particle monolayer as an etch mask

Tsutomu Nakanishi, Toshiro Hiraoka, Akira Fujimoto, Satoshi Saito, Koji Asakawa

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 643 KB

english, 2006

160

Formation of more stable hydrophilic surfaces of PDMS by plasma and chemical treatments

Dhananjay Bodas, Chantal Khan-Malek

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 113 KB

english, 2006

161

Preface

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 50 KB

english, 2006

162

Nanofabrication of negative refractive index metasurfaces

Zoran Jakšić, Dana Vasiljević-Radović, Milan Maksimović, Milija Sarajlić, Aleksandar Vujanić, Zoran Djurić

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 2.08 MB

english, 2006

163

Integrating nanotechnology into a working storage device

A. Knoll, P. Bächtold, J. Bonan, G. Cherubini, M. Despont, U. Drechsler, U. Dürig, B. Gotsmann, W. Häberle, C. Hagleitner, D. Jubin, M.A. Lantz, A. Pantazi, H. Pozidis, H. Rothuizen, A. Sebastian, R.

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 590 KB

english, 2006

164

Local modification of micellar layers using nanoscale dispensing

André Meister, Sivashankar Krishnamoorthy, Christian Hinderling, Raphaël Pugin, Harry Heinzelmann

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 368 KB

english, 2006

165

Back-side alignment strategy decouples process from alignment and achieves leading edge overlay performance

F.G.C. Bijnen, W.V. Buel, M. Young, X. Zhou, C. Gooch

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 631 KB

english, 2006

166

Microtransfer molding of hydrophobic dendrimer

C. Thibault, C. Severac, E. Trévisiol, C. Vieu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 1.26 MB

english, 2006

167

A lithographic polymer process sequence for chemical sensing arrays

Maria Kitsara, Dimitrios Goustouridis, Stavros Chatzandroulis, Konstantinos Beltsios, Ioannis Raptis

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 706 KB

english, 2006

168

Combined Al-protection and HF-vapor release process for ultrathin single crystal silicon cantilevers

S. Mouaziz, G. Boero, G. Moresi, C. Degen, Q. Lin, B. Meier, J. Brugger

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 167 KB

english, 2006

169

Micron-sized mechanical oscillators created by 3D two-photon polymerization: Towards a mechanical logic device

A. Knoll, U. Dürig, O. Züger, H.-J. Güntherodt

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 253 KB

english, 2006

170

Status and prospects of UV-Nanoimprint technology

M. Bender, A. Fuchs, U. Plachetka, H. Kurz

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 179 KB

english, 2006

171

History of the Vienna Hofburg

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 225 KB

english, 2006

172

Piezoresistive cantilevers in a commercial CMOS technology for intermolecular force detection

Guillermo Villanueva, Francesc Pérez-Murano, Martin Zimmermann, Jan Lichtenberg, Joan Bausells

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 212 KB

english, 2006

173

Alternative micro-hotplate design for low power sensor arrays

R. Triantafyllopoulou, S. Chatzandroulis, C. Tsamis, A. Tserepi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 166 KB

english, 2006

174

Non-destructive high-resolution X-ray imaging of ULSI micro-electronics using keV X-ray microscopy in Zernike phase contrast

Ulrich Neuhäusler, Gerd Schneider

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 310 KB

english, 2006

175

Nonmagnetic to magnetic nanostructures via ion irradiation

B.N. Dev, S. Bera, B. Satpati, D.K. Goswami, K. Bhattacharjee, P.V. Satyam, K. Yamashita, O.M. Liedke, K. Potzger, J. Fassbender, F. Eichhorn, R. Gröetzschel

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 517 KB

english, 2006

176

MEMS complete blood count sensors designed to reduce noise from electrolysis gas

Rikiya Tanabe, Seiichi Hata, Akira Shimokohbe

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 425 KB

english, 2006

177

Carbon nanotubes for integration into nanocomposite materials

I. Bright, V. Koutsos, Q. Li, R. Cheung

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 234 KB

english, 2006

178

Toward a comparative study of protein crystallization in microfluidic chambers using vapor diffusion and batch techniques

M. Lounaci, P. Rigolet, G. Velve Casquillas, H.W. Huang, Y. Chen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 227 KB

english, 2006

179

The fabrication and characterisation of metallic nanotransistors

H.H. Cheng, C.N. Andrew, M.M. Alkaisi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 166 KB

english, 2006

180

Electrical characterization of molecular monolayers containing tungsten polyoxometalates

Nikos Glezos, Antonios M. Douvas, Panagiotis Argitis, Frank Saurenbach, Juergen Chrost, Christos Livitsanos

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 267 KB

english, 2006

181

Nanoimprinted devices for integrated organic electronics

Günther Leising, Barbara Stadlober, Ursula Haas, Anja Haase, Christian Palfinger, Herbert Gold, Georg Jakopic

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 2.06 MB

english, 2006

182

Methods to reduce lithography costs with reticle engineering

R. Scott Mackay, Henry Kamberian, Yuan Zhang

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 212 KB

english, 2006

183

Lithographic manufacturing robustness analysis for as drawn patterns

Lawrence S. Melvin III, Qiliang Yan, William F. Kielhorn

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 179 KB

english, 2006

184

Performance of dilatometer for determining absolute CTE of EUVL LTEMs

Yoshimasa Takeichi, Iwao Nishiyama, Naofumi Yamada

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 213 KB

english, 2006

185

A manufacturable miniature electron beam column

James P. Spallas, Charles S. Silver, Lawrence P. Muray, Torquil Wells, Mohamed El-Gomati

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 410 KB

english, 2006

186

Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator

Stefan Eder-Kapl, Ernst Haugeneder, Helmut Langfischer, Klaus Reimer, Joerg Eichholz, Martin Witt, Hans-Joachim Doering, Joachim Heinitz, Christoph Brandstaetter

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 293 KB

english, 2006

187

Axicon lens on optical fiber forming optical tweezers, made by focused ion beam milling

S. Cabrini, C. Liberale, D. Cojoc, A. Carpentiero, M. Prasciolu, S. Mora, V. Degiorgio, F. De Angelis, E. Di Fabrizio

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 258 KB

english, 2006

188

Magnetic levitation systems compared to conventional bearing systems

A.T.A. Peijnenburg, J.P.M. Vermeulen, J. van Eijk

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 159 KB

english, 2006

189

Multibeam electron source for nanofabrication using electron beam induced deposition

M.J. van Bruggen, B. van Someren, P. Kruit

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 375 KB

english, 2006

190

Direct pattern transfer for sub-45 nm features using nanoimprint lithography

Ngoc V. Le, William J. Dauksher, Kathy A. Gehoski, Kevin J. Nordquist, Eric Ainley, Pawitter Mangat

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 200 KB

english, 2006

191

Current overview of commercially available imprint templates and directions for future development

John G. Maltabes, R. Scott Mackay

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 128 KB

english, 2006

192

Reversible assembling of microfluidic devices by aspiration

M. Le Berre, C. Crozatier, G. Velve Casquillas, Y. Chen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 209 KB

english, 2006

193

Nanoscale electrochemical probes for single cell analysis

R.J. Fasching, S.-J. Bai, T. Fabian, F.B. Prinz

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 209 KB

english, 2006

194

Twin cantilevers with a nanogap for single molecule experimentation

Marco Lazzarino, Elena De Marchi, Massimo Bressanutti, Lisa Vaccari, Stefano Cabrini, Chiara Schmid, Rosa Poetes, Giacinto Scoles

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 149 KB

english, 2006

195

Electrically isolated nanostructures fabricated using self-assembled multilayers and a novel negative-tone bi-layer resist stack

Charan Srinivasan, Mary E. Anderson, R. Jayaraman, Paul S. Weiss, Mark W. Horn

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 181 KB

english, 2006

196

The limits of CD metrology

Bryan J. Rice, Heidi Cao, Michael Grumski, Jeanette Roberts

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 477 KB

english, 2006

197

Tri-layer soft UV imprint lithography and fabrication of high density pillars

J. Shi, C. Peroz, D. Peyrade, J. Salari, M. Belotti, W.H. Huang, Y. Chen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 299 KB

english, 2006

198

Present status and future prospects of LEEPL

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 1.10 MB

english, 2006

199

High-aspect-ratio structure formation techniques for three-dimensional metal-oxide-semiconductor transistors

Hideo Sunami, Shunpei Matsumura, Koji Yoshikawa, Kiyoshi Okuyama

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 650 KB

english, 2006

200

IFC: Editorial Board

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 32 KB

english, 2006

201

Table of Contents

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 166 KB

english, 2006

202

Author Index to MNE 2005 (Vol. 83/4-9)

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 242 KB

english, 2006

203

Status and future of maskless lithography

Daniel Henry, Jan Willem Gemmink, Laurent Pain, Sergei V. Postnikov

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 109 KB

english, 2006

204

Nanoelectronics beyond silicon

Wolfgang Hoenlein, Georg S. Duesberg, Andrew P. Graham, Franz Kreupl, Maik Liebau, Werner Pamler, Robert Seidel, Eugen Unger

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 689 KB

english, 2006

205

Optical heating for short hot embossing cycle times

K. Seunarine, N. Gadegaard, M.O. Riehle, C.D.W. Wilkinson

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 306 KB

english, 2006

206

Perforated polymer membranes fabricated by nanoimprint

Helmut Schift, Sandro Bellini, Jens Gobrecht

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 184 KB

english, 2006

207

Tin based laser-produced plasma source development for EUVL

P. Hayden, J. White, A. Cummings, P. Dunne, M. Lysaght, N. Murphy, P. Sheridan, G. O’Sullivan

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 250 KB

english, 2006

208

A new approach for actinic defect inspection of EUVL multilayer mask blanks: Standing wave photoemission electron microscopy

U. Neuhäusler, J. Lin, A. Oelsner, M. Schicketanz, D. Valdaitsev, J. Slieh, N. Weber, M. Brzeska, A. Wonisch, T. Westerwalbesloh, A. Brechling, H. Brückl, M. Escher, M. Merkel, G. Schönhense, U. Klein

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 251 KB

english, 2006

209

From hyper NA to low NA

Martin McCallum, Gene Fuller, Soichi Owa

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 187 KB

english, 2006

210

Nanoscale imaging with a portable field emission scanning electron microscope

Anjam Khursheed, Karuppiah Nelliyan, Yu Ding

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 862 KB

english, 2006

211

Low-energy electron-beam lithography of hydrogen silsesquioxane

Haifang Yang, Aizi Jin, Qiang Luo, Changzhi Gu, Zheng Cui, Yifang Chen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 191 KB

english, 2006

212

Pattern replication of 100 nm to millimeter-scale features by thermal nanoimprint lithography

Bo Cui, Teodor Veres

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 157 KB

english, 2006

213

Polyimide nanostructures fabricated by nanoimprint lithography and its applications

Bo Cui, Yann Cortot, Teodor Veres

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 234 KB

english, 2006

214

Multi-colour micro-contact printing based on microfluidic network inking

C. Crozatier, M. Le Berre, Y. Chen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 259 KB

english, 2006

215

Towards the creation of quantum dots using FIB technology

P. Kitslaar, M. Strassner, I. Sagnes, E. Bourhis, X. Lafosse, C. Ulysse, C. David, R. Jede, L. Bruchhaus, J. Gierak

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 286 KB

english, 2006

216

Mechanical characterization of membrane like microelectronic components

M. Držı́k, H. Löschner, E. Haugeneder, W. Fallman, P. Hudek, I.W. Rangelow, Y. Sarov, T. Lalinský, J. Chlpı́k

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 271 KB

english, 2006

217

Supercritical drying process for high aspect-ratio HSQ nano-structures

T. Wahlbrink, Daniel Küpper, Y.M. Georgiev, J. Bolten, M. Möller, David Küpper, M.C. Lemme, H. Kurz

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 286 KB

english, 2006

218

Fabrication of photonic crystal structures in polymer waveguide material

Uwe Huebner, R. Boucher, W. Morgenroth, M. Schmidt, M. Eich

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 298 KB

english, 2006

219

Condensation mechanism of microbubbles depending on DFR pattern design

Akira Kawai, Hotaka Endo, Tomotaka Ariga

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 145 KB

english, 2006

220

Direct-write deposition with a focused electron beam

M. Fischer, H.D. Wanzenboeck, J. Gottsbachner, S. Müller, W. Brezna, M. Schramboeck, E. Bertagnolli

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 139 KB

english, 2006

221

Nickel stamp fabrication using step & stamp imprint lithography

Tomi Haatainen, Päivi Majander, Tommi Riekkinen, Jouni Ahopelto

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 620 KB

english, 2006

222

Membrane mask aero and thermoelastic control for proximity lithography

Dryver Huston, James Plumpton, Brian Esser, Dylan Burns, Brent Boerger, Robert Selzer

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 272 KB

english, 2006

223

Fabrication of three-dimensional microlens arrays in sol–gel glass

J.-B. Orhan, V.K. Parashar, A. Sayah, M.A.M. Gijs

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 308 KB

english, 2006

224

Polymeric electrolytes for WO3-based all solid-state electrochromic displays

Maria Vasilopoulou, Ioannis Raptis, Panagiotis Argitis, Ioannis Aspiotis, Dimitris Davazoglou

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 315 KB

english, 2006

225

Free-standing inductive grid filter for infrared radiation rejection

Konstantins Jefimovs, Janne Laukkanen, Tuomas Vallius, Tero Pilvi, Mikko Ritala, Tomi Meilahti, Matti Kaipiainen, Marcos Bavdaz, Markku Leskelä, Jari Turunen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 271 KB

english, 2006

226

Capacitive pressure sensors and switches fabricated using strain compensated SiGeB

S. Chatzandroulis, S. Koliopoulou, D. Goustouridis, D. Tsoukalas

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 160 KB

english, 2006

227

Electrostatic chuck for EUV masks

Gerhard Kalkowski, Stefan Risse, Sandra Müller, Gerd Harnisch

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 295 KB

english, 2006

228

A mechanically actuated silicon microgripper for handling micro- and nanoparticles

Marius M. Blideran, Günter Bertsche, Wolfgang Henschel, Dieter P. Kern

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 305 KB

english, 2006

229

Super-resolution near-field lithography using planar silver lenses: A review of recent developments

Richard J. Blaikie, David O.S. Melville, Maan M. Alkaisi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 546 KB

english, 2006

230

Novel fabrication of a curved micro-mirror for optical interconnection

Min-Woo Lee, Chul Hyun Choi, Kyung Jin Lim, Beom-Hoan O, Seung Gol Lee, Se-Geun Park, El-Hang Lee

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 341 KB

english, 2006

231

Advanced methods and tools for handling and assembly in microtechnology – A European approach in FP6

W. Brenner, A. Almansa-Martin, F. Sümecz

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 75 KB

english, 2006

232

Assembly of an aperture plate system for projection mask-less lithography

M. Mohaupt, R. Eberhardt, C. Damm, T. Peschel, A. Tünnermann, E. Haugeneder, H.-J. Döring, C. Brandstätter

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 224 KB

english, 2006

233

Thermally driven microgripper as a tool for micro assembly

Katerina Ivanova, Tzvetan Ivanov, Ali Badar, Burkhard E. Volland, Ivo W. Rangelow, Daniela Andrijasevic, Franz Sümecz, Stephanie Fischer, Manfred Spitzbart, Werner Brenner, Ivan Kostic

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 197 KB

english, 2006

234

Simulation software for designing electron and ion beam equipment

E. Munro, J. Rouse, H. Liu, L. Wang, X. Zhu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 1.20 MB

english, 2006

235

Electron beam lithography, a helpful tool for nanooptics

Andreas Hohenau, Harald Ditlbacher, Bernhard Lamprecht, Joachim R. Krenn, Alfred Leitner, Franz R. Aussenegg

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 207 KB

english, 2006

236

Nano-dots formation on silver sulphide surface using electron beam irradiation

Hayato Sone, Takuro Tamura, Ken Miyazaki, Sumio Hosaka

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 304 KB

english, 2006

237

Ion-beam direct-structuring of high-temperature superconductors

W. Lang, M. Dineva, M. Marksteiner, T. Enzenhofer, K. Siraj, M. Peruzzi, J.D. Pedarnig, D. Bäuerle, R. Korntner, E. Cekan, E. Platzgummer, H. Loeschner

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 748 KB

english, 2006

238

Transitioning of direct e-beam write technology from research and development into production flow

L. Pain, B. Icard, S. Manakli, J. Todeschini, B. Minghetti, V. Wang, D. Henry

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 319 KB

english, 2006

239

Ion beam imprinting system for nanofabrication

Qing Ji, Ye Chen, Lili Ji, Ximan Jiang, Ka-Ngo Leung

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 386 KB

english, 2006

240

The EUV metrology program of PTB

R. Klein, C. Laubis, R. Müller, F. Scholze, G. Ulm

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 181 KB

english, 2006

241

Fabrication of multi-layered nano-channels by reversal imprint lithography

Masaki Nakajima, Takashi Yoshikawa, Kenji Sogo, Yoshihiko Hirai

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 850 KB

english, 2006

242

Fabrication of micro-coils using laser scan lithography on copper pipes

Yoshihisa Kaneko, Kohei Hashimoto, Toshiyuki Horiuchi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 618 KB

english, 2006

243

High resolution e-beam lithography using a thin titanium layer to promote resist adhesion

D.S. Macintyre, I. Young, A. Glidle, X. Cao, J.M.R. Weaver, S. Thoms

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 288 KB

english, 2006

244

Comparison of FIB-CVD and EB-CVD growth characteristics

Jun-ya Igaki, Kazuhiro Kanda, Yuichi Haruyama, Masahiko Ishida, Yukinori Ochiai, Jun-ichi Fujita, Takashi Kaito, Shinji Matsui

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 220 KB

english, 2006

245

Microfluidic devices with integrated active valves based on thermoplastic elastomers

Ivan Stoyanov, Michael Tewes, Michael Koch, Markus Löhndorf

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 172 KB

english, 2006

246

A disposable biosensor with Prussian blue deposited electrode

In-Je Yi, Ju-Ho Kim, Y.J. Choi, C.J. Kang, Yong-Sang Kim

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 140 KB

english, 2006

247

Preparation of nanostructured Titanium surfaces for investigations of the interface between cell monolayers and Titanium

A. Heeren, C. Burkhardt, H. Wolburg, W. Henschel, W. Nisch, D.P. Kern

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 313 KB

english, 2006

248

Electrical detection of DNA using gold and magnetic nanoparticles and bio bar-code DNA between nanogap electrodes

Tien-Li Chang, Chien-Ying Tsai, Chih-Chen Sun, Ramesh Uppala, Chun-Chi Chen, Chun-Hung Lin, Ping-Hei Chen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 798 KB

english, 2006

249

Towards the bottom-up concept: Extended quantum-dot cellular automata

Iztok Lebar Bajec, Nikolaj Zimic, Miha Mraz

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 108 KB

english, 2006

250

Characterization of Ru layer for capping/buffer application in EUVL mask

Tae Geun Kim, Seung Yoon Lee, Chung Yong Kim, In-Sung Park, In-Yong Kang, Nae-Eung Lee, Yong-Chae Chung, Jinho Ahn

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 225 KB

english, 2006

251

Micro wetting system by controlling pinning and capillary forces

Takayoshi Niiyama, Akira Kawai

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 245 KB

english, 2006

252

Focused ion beam sculpted membranes for nanoscience tooling

A.-L. Biance, J. Gierak, É. Bourhis, A. Madouri, X. Lafosse, G. Patriarche, G. Oukhaled, C. Ulysse, J.-C. Galas, Y. Chen, L. Auvray

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 251 KB

english, 2006

253

Nanopatterning of colloidal nanocrystals emitters dispersed in a PMMA matrix by e-beam lithography

Luigi Martiradonna, Tiziana Stomeo, Milena De Giorgi, Roberto Cingolani, Massimo De Vittorio

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 391 KB

english, 2006

254

Measurement and simulation of impinging precursor molecule distribution in focused particle beam deposition/etch systems

Ivo Utke, Vinzenz Friedli, Simone Amorosi, Johann Michler, Patrik Hoffmann

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 371 KB

english, 2006

255

Processing and simulation of few nm thick high-κ dielectric films

S. Abermann, C. Jordan, M. Harasek, E. Bertagnolli

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 178 KB

english, 2006

256

High resolution 100 kV electron beam lithography in SU-8

B. Bilenberg, S. Jacobsen, M.S. Schmidt, L.H.D. Skjolding, P. Shi, P. Bøggild, J.O. Tegenfeldt, A. Kristensen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 163 KB

english, 2006

257

Study of mechanisms involved in photoresist microlens formation

S. Audran, B. Faure, B. Mortini, J. Regolini, G. Schlatter, G. Hadziioannou

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 226 KB

english, 2006

258

Chemically amplified molecular resists for electron beam lithography

A.P.G. Robinson, H.M. Zaid, F.P. Gibbons, R.E. Palmer, M. Manickam, J.A. Preece, R. Brainard, T. Zampini, K. O’Connell

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 261 KB

english, 2006

259

Fabrication and characterization of freestanding Si/Cr micro- and nanospirals

Li Zhang, Lixin Dong, Dominik J. Bell, Bradley J. Nelson, Christian Schönenberger, Detlev Grützmacher

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 212 KB

english, 2006

260

Characterization of stray light of ArF lithographic tools: Modeling of power spectral density of an optical pupil

Young-Chang Kim, Peter De Bisschop, Geert Vandenberghe

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 197 KB

english, 2006

261

Biodynamical analysis microfluidic system

Marioara Avram, Andrei Avram, Ciprian Iliescu

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 258 KB

english, 2006

262

Optimisation of HSQ e-beam lithography for the patterning of FinFET transistors

Frédérique Fruleux-Cornu, Julien Penaud, Emmanuel Dubois, Marc François, Michel Muller

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 225 KB

english, 2006

263

A review of line edge roughness and surface nanotexture resulting from patterning processes

Evangelos Gogolides, Vassilios Constantoudis, George P. Patsis, Angeliki Tserepi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 834 KB

english, 2006

264

Organic selective-area patterning method for microlens array fabrication

Wen-Kuei Huang, Chu-Jung Ko, Fang-Chung Chen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 186 KB

english, 2006

265

Electron-beam induced deposition of a nanotip within a nano-aperture structure

Arthur M. Blackburn, David G. Hasko, David A. Williams

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 482 KB

english, 2006

266

Through pitch contact hole imaging for the 65 nm node

Jan Pieter Kuijten, Will Conley, Arjan Verhappen, Martin Chaplin, Robert Socha, Lloyd Litt, Scott Warwick

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 521 KB

english, 2006

267

Investigation of silicon isolated double quantum-dot energy levels for quantum computation

Michael G. Tanner, David G. Hasko, David A. Williams

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 322 KB

english, 2006

268

SU8 bio-chemical sensor microarrays

J.H.T. Ransley, M. Watari, D. Sukumaran, R.A. McKendry, A.A. Seshia

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 331 KB

english, 2006

269

FIB-milling of photonic structures and sputtering simulation

Philipp M. Nellen, Victor Callegari, Rolf Brönnimann

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 271 KB

english, 2006

270

Fabrication of luminescent carbon nanotubes

B.P. Zhang, K. Shimazaki, M. Suzuki, T. Shiokawa, Y. Homma, K. Ishibashi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 215 KB

english, 2006

271

Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes

Steven Steen, Sharee J. McNab, Lidija Sekaric, Inna Babich, Jyotica Patel, Jim Bucchignano, Michael Rooks, David M. Fried, Anna W. Topol, Jim R. Brancaccio, Roy Yu, John M. Hergenrother, James P. Doyl

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 305 KB

english, 2006

272

Biochip-compatible packaging and micro-fluidics for a silicon opto-electronic biosensor

H.H. Ruf, T. Knoll, K. Misiakos, R.B. Haupt, M. Denninger, L.B. Larsen, P.S. Petrou, S.E. Kakabakos, E. Ehrentreich-Förster, F.F. Bier

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 198 KB

english, 2006

273

Sloped side walls in SU-8 structures with ‘Step-and-Flash’ processing

Maria Nordström, Jörg Hübner, Anja Boisen

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 172 KB

english, 2006

274

Electrically conducting Bi cluster-assembled wires formed using SiN nanostencils

Jim G. Partridge, David M.A. Mackenzie, René Reichel, Simon A. Brown

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 200 KB

english, 2006

275

Scanning probe arrays for life sciences and nanobiology applications

Laure Aeschimann, André Meister, Terunobu Akiyama, Benjamin W. Chui, Philippe Niedermann, Harry Heinzelmann, Nico F. De Rooij, Urs Staufer, Peter Vettiger

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 239 KB

english, 2006

276

Employing a detailed compositional analysis to develop a low defect Mo/Si deposition tool and process for EUVL mask blanks

Andy Ma, Rajul Randive, Patrick Kearney, San-In Han, Soon-Cheon Seo, Toshiyuki Uno, Dave Krick, Paul Mirkarimi, Eberhard Spiller

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 150 KB

english, 2006

277

Fabrication of hall device structures in 3C-SiC using microelectromechanical processing technology

L. Jiang, S. Anderson, E. Thong, R. Cheung, C.A. Zorman, M. Mehregany

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 364 KB

english, 2006

278

Cell wall cutting tool and nano-net fabrication by FIB-CVD for subcellular operations and analysis

Reo Kometani, Ryoko Funabiki, Takayuki Hoshino, Kazuhiro Kanda, Yuichi Haruyama, Takashi Kaito, Jun-ichi Fujita, Yukinori Ochiai, Shinji Matsui

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 319 KB

english, 2006

279

Method for the simple catalytic carbon nano-fibers growth in air

Simas Rackauskas, Valentinas Snitka

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 282 KB

english, 2006

280

Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography

Henry I. Smith, Rajesh Menon, Amil Patel, David Chao, Michael Walsh, G. Barbastathis

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 394 KB

english, 2006

281

Development of a micro-bellows actuator using micro-stereolithography technology

Hyun-Wook Kang, In Hwan Lee, Dong-Woo Cho

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 279 KB

english, 2006

282

Nanocharacterization of electrocoated polymers on carbon fibers

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 330 KB

english, 2006

283

Polarization effects in plasmonic masks

Frank Schellenberg, Kostas Adam, Liying Sun, Joe Matteo, Lambertus Hesselink

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 428 KB

english, 2006

284

Metal nano-floating gate memory devices fabricated at low temperature

S. Koliopoulou, P. Dimitrakis, D. Goustouridis, P. Normand, C. Pearson, M.C. Petty, H. Radamson, D. Tsoukalas

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 189 KB

english, 2006

285

Hybrid lithography process for nano-scale devices

S. Pauliac, S. Landis, J. Foucher, J. Thiault, O. Faynot

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 377 KB

english, 2006

286

AFM based polarization nanolithography on PZT sol–gel films

Valentinas Snitka, Arturas Ulcinas, Kestutis Nemciauskas, Vitas Lendraitis

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 376 KB

english, 2006

287

Present and future of 193 nm lithography

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 480 KB

english, 2006

288

Profile evolution during thermal nanoimprint

H.-C. Scheer, N. Bogdanski, M. Wissen, T. Konishi, Y. Hirai

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 472 KB

english, 2006

289

Manufacturable MEMS miniSEMs

R. Saini, Z. Jandric, J. Gammell, S.A.M. Mentink, D. Tuggle

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 229 KB

english, 2006

290

Advances in microchannel amplifiers for maskless lithography

Anton S. Tremsin, David R. Beaulieu, Harry F. Lockwood

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 123 KB

english, 2006

291

Direct observation and localization of colloidal nanoparticles on patterned surface by capillary forces

D. Peyrade, M. Gordon, G. Hyvert, K. Berton, J. Tallal

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 297 KB

english, 2006

292

Direct, in-scanner, aerial image sensing

R. Fabian Pease

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 531 KB

english, 2006