Electron-beam lithography simulation for the fabrication of EUV masks
George P. Patsis, Nikos Tsikrikas, Ioanis Raptis, Nikos GlezosVolume:
83
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2006.01.040
File:
PDF, 135 KB
english, 2006