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Thickness-dependent glass transition temperature of thin resist films for high resolution lithography
S. Marceau, J.-H. Tortai, J. Tillier, N. Vourdas, E. Gogolides, I. Raptis, K. Beltsios, K. van WerdenVolume:
83
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2006.01.227
File:
PDF, 509 KB
english, 2006