X-ray metrology for high-k atomic layer deposited HfxZr1−xO2 films
Jesus J. Gallegos III, Dina H. Triyoso, Mark RaymondVolume:
85
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2007.02.013
File:
PDF, 642 KB
english, 2008