Controlling resist thickness and etch depth for fabrication...

Controlling resist thickness and etch depth for fabrication of 3D structures in electron-beam grayscale lithography

J. Kim, D.C. Joy, S.-Y. Lee
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Volume:
84
Year:
2007
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2007.02.015
File:
PDF, 427 KB
english, 2007
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