Atomic layer deposition of Ge2Sb2Te5 thin films

Microelectronic Engineering 2009 Vol. 86; Iss. 7-9

Atomic layer deposition of Ge2Sb2Te5 thin films

Mikko Ritala, Viljami Pore, Timo Hatanpää, Mikko Heikkilä, Markku Leskelä, Kenichiro Mizohata, Alejandro Schrott, Simone Raoux, Stephen M. Rossnagel
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Volume:
86
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.03.014
File:
PDF, 623 KB
english, 2009
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