Comparison between the electrical properties of atomic...

Microelectronic Engineering 2009 Vol. 86; Iss. 7-9

Comparison between the electrical properties of atomic layer deposited thin ZrO2 films processed from cyclopentadienyl precursors

Salvador Dueñas, Helena Castán, Héctor García, Alfonso Gómez, Luis Bailón, Kaupo Kukli, Jaakko Niinistö, Mikko Ritala, Markku Leskelä
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
86
Year:
2009
Language:
english
Pages:
3
DOI:
10.1016/j.mee.2009.03.103
File:
PDF, 393 KB
english, 2009
Conversion to is in progress
Conversion to is failed