Lithography guided horizontal growth of silicon nanowires for the fabrication of ultrasensitive piezoresistive strain gauges
Marta Fernández-Regúlez, Jose A. Plaza, Emilio Lora-Tamayo, Alvaro San PauloVolume:
87
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.10.050
File:
PDF, 651 KB
english, 2010