Volume 87; Issue 5-8

Microelectronic Engineering

Volume 87; Issue 5-8
17

172 nm pre-treatment for PDMS/PDMS replication

S. Möllenbeck, N. Bogdanski, A. Mayer, H.-C. Scheer, J. Zajadacz, K. Zimmer
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 209 KB
english, 2010
18

Improving the imaging quality of MOEs in DMD-based maskless lithography

XiaoWei Guo, Yongzhi Liu
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 481 KB
english, 2010
30

Motility of bacteria in microfluidic structures

Marie Binz, Abraham P. Lee, Clive Edwards, Dan V. Nicolau
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 284 KB
english, 2010
34

Sensitivity enhancement of SPR biosensor by improving surface quality of glass slides

X. Chen, M. Pan, K. Jiang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 566 KB
english, 2010
37

Three-dimensional pattern transfer on quartz substrates

K. Mohamed, M.M. Alkaisi
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 548 KB
english, 2010
38

Simulation of the nanostructuring of surfaces under ion-beam bombardment

Florin Fulga, Dan V. Nicolau
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 302 KB
english, 2010
48

Thermoelectric energy harvester fabricated by Stepper

J. Su, Ruud J.M. Vullers, M. Goedbloed, Y. van Andel, V. Leonov, Z. Wang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 826 KB
english, 2010
55

New hybrid organic–inorganic sol–gel positive resist

L. Brigo, A. Pistore, G. Grenci, A. Carpentiero, F. Romanato, G. Brusatin
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 379 KB
english, 2010
60

Silver/silver-chloride electrode fabrication in closed micro-fluidic capillaries

Friedjof Heuck, Urs Staufer
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 772 KB
english, 2010
61

3D opto-electrical device stacking on CMOS

L. Dellmann, U. Drechsler, T. Morf, H. Rothuizen, R. Stutz, J. Weiss, M. Despont
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 539 KB
english, 2010
64

Guide structure with pole arrays imprinted on nylon fiber

Harutaka Mekaru, Osamu Koizumi, Akihisa Ueno, Masaharu Takahashi
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 1.74 MB
english, 2010
71

Inverted tapered pillars for mass sensing

Mauro Melli, Alessandro Pozzato, Marco Lazzarino
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 270 KB
english, 2010
76

3D stacked arrays of fins and nanowires on bulk silicon

M. Bopp, P. Coronel, C. Hibert, A.M. Ionescu
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 360 KB
english, 2010
87

Potential and limitations of a T-NIL/UVL hybrid process

H.-C. Scheer, M. Wissen, N. Bogdanski, S. Möllenbeck, A. Mayer
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 1.05 MB
english, 2010
95

Preface

Kurt Ronse, Dries Van Thourhout, Stefan De Gendt, Liesbet Lagae, Geert Vandenberghe, Ann Witvrouw
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 89 KB
english, 2010
106

Nanotomography based study of gas diffusion layers

H. Ostadi, P. Rama, Y. Liu, R. Chen, X. Zhang, K. Jiang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 229 KB
english, 2010
112

Suspended membranes, cantilevers and beams using SU-8 foils

J. Melai, V.M. Blanco Carballo, C. Salm, J. Schmitz
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 614 KB
english, 2010
114

Optimized process for the fabrication of zirconia micro parts

H. Hassanin, K. Jiang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 319 KB
english, 2010
118

Projection Mask-Less Lithography (PML2)

Christof Klein, Jan Klikovits, Laszlo Szikszai, Elmar Platzgummer, Hans Loeschner
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 3.05 MB
english, 2010
120

Functionally graded microceramic components

H. Hassanin, K. Jiang
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 306 KB
english, 2010
124

Micro-pressure sensor made of conductive PDMS for microfluidic applications

H. Li, C.X. Luo, H. Ji, Qi Ouyang, Y. Chen
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 379 KB
english, 2010
139

An integrated field emission array for ion desorption

P.J. Resnick, C.E. Holland, P.R. Schwoebel, K.L. Hertz, D.L. Chichester
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 435 KB
english, 2010
142

Graphene electrodes for n-type organic field-effect transistors

Henrik H. Henrichsen, Peter Bøggild
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 214 KB
english, 2010
150

Generation of metal patterns by topography-directed deposition

Dianpeng Qi, Nan Lu, Bingjie Yang, Hongbo Xu, Miaojun Xu, Lifeng Chi
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 330 KB
english, 2010
153

Three-dimensional surface sculpting of freestanding metal-composite nanomembranes

Jovan Matović, Zoran Jakšić
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 311 KB
english, 2010
159

Lithography on GaMnAs layer by AFM local anodic oxidation in the AC mode

M. Janoušek, J. Halada, J. Voves
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 548 KB
english, 2010
164

Lithography scaling issues associated with III–V MOSFETs

O. Ignatova, S. Thoms, W. Jansen, D.S. Macintyre, I. Thayne
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 280 KB
english, 2010
172

Two-tone metal pattern transfer technique using a single mold surface

Noriyuki Unno, Jun Taniguchi
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 874 KB
english, 2010
173

In- and Sb-doped tin oxide nanocrystalline films for selective gas sensing

Alexandra Zima, Anton Köck, Thomas Maier
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 854 KB
english, 2010
186

Incident angle dependent damage of PMMA during Ar+-ion beam etching

Sandra Wolff, Bert Lägel, Stefan Trellenkamp
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 312 KB
english, 2010
187

Cell imprinting and AFM imaging of cells cultured on nanoline patterns

X.T. Zhou, F. Zhang, J. Hu, X. Li, X.M. Ma, Y. Chen
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 414 KB
english, 2010
195

Wettability control using large-area nanostructured film

K. Kurihara, Y. Suzuki, K. Suto, N. Shiba, T. Nakano, J. Tominaga
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 487 KB
english, 2010
196

4-D dielectrophoretic handling of Janus particles in a microfluidic chip

T. Honegger, O. Lecarme, K. Berton, D. Peyrade
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 839 KB
english, 2010
203

Electron beam lithography on cylindrical roller

Shih Chun Tseng, Wen Yang Peng, Yi Fan Hsieh, Ping Jen Lee, Wen Lang Lai
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 732 KB
english, 2010
206

New approach to estimate nanowear test results through nanoindentation test

M.A. Ekwińska, Z. Rymuza
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 469 KB
english, 2010
207

Flexible and tactile sensor based on a photosensitive polymer

Ji-Chang Lee, Dong-Weon Lee
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 1.08 MB
english, 2010
208

Double-fin FETs based on standard CMOS approach

Michał Zaborowski, Daniel Tomaszewski, Andrzej Panas, Piotr Grabiec
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 520 KB
english, 2010
209

Nanostructures for all-polymer microfluidic systems

Maria Matschuk, Henrik Bruus, Niels B. Larsen
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 372 KB
english, 2010
212

Fabrication for metal photomask pattern by using fountain-pen nanolithography

Miki Onoue, Hirobumi Ushijima
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 380 KB
english, 2010
218

Trapping of hyaluronic acid molecules on sharp nano-electrodes of various metals

H. Takeuchi, T. Mineta, E. Makino
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 808 KB
english, 2010
223

High resolution and hybrid patterning for single cell attachment

J. Hu, J. Shi, F. Zhang, L. Lei, X. Li, L. Wang, L. Liu, Y. Chen
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 389 KB
english, 2010
226

Resonant surface roughness interactions in planar superlenses

Mikkel Schøler, Richard J. Blaikie
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 298 KB
english, 2010
229

High optical quality site-controlled quantum dots

T.J. Pfau, A. Gushterov, J.P. Reithmaier, I. Cestier, G. Eisenstein
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 348 KB
english, 2010
236

Influence of the dose distribution on resist development properties

M.A. Knyazev, A.A. Svintsov, S.I. Zaitsev
Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 371 KB
english, 2010
249

Inside Front Cover - Editorial Board

Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 28 KB
english, 2010
250

Table of Contents

Journal:
Microelectronic Engineering
Year:
2010
Language:
english
File:
PDF, 127 KB
english, 2010