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Simulation of shot noise effect on CD and LER of electron-beam lithography in 32 nm designs
G.P. Patsis, N. Tsikrikas, D. Drygiannakis, I. RaptisVolume:
87
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.11.014
File:
PDF, 598 KB
english, 2010