Effects of surface passivation during atomic layer...

Microelectronic Engineering 2011 Vol. 88; Iss. 4

Effects of surface passivation during atomic layer deposition of Al2O3 on In0.53Ga0.47As substrates

L. Lamagna, M. Fusi, S. Spiga, M. Fanciulli, G. Brammertz, C. Merckling, M. Meuris, A. Molle
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Volume:
88
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2010.10.035
File:
PDF, 579 KB
english, 2011
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