Optimization of low temperature silicon nitride processes...

Microelectronics Reliability 2005 Vol. 45; Iss. 5-6

Optimization of low temperature silicon nitride processes for improvement of device performance

E. Sleeckx, M. Schaekers, X. Shi, E. Kunnen, B. Degroote, M. Jurczak, M. de Potter de ten Broeck, E. Augendre
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Volume:
45
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.microrel.2004.10.028
File:
PDF, 278 KB
english, 2005
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