Electrical characterization of hafnium oxide and...

Microelectronics Reliability 2005 Vol. 45; Iss. 5-6

Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition

S. Dueñas, H. Castán, H. García, J. Barbolla, K. Kukli, J. Aarik, M. Ritala, M. Leskelä
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Volume:
45
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.microrel.2004.11.052
File:
PDF, 388 KB
english, 2005
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