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A new method for the lifetime determination of submicron metal interconnects by means of a parallel test structure
K. Vanstreels, M. D’Olieslaeger, W. De Ceuninck, J. D’Haen, K. MaexVolume:
45
Year:
2005
Language:
english
Pages:
7
DOI:
10.1016/j.microrel.2004.12.010
File:
PDF, 231 KB
english, 2005