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Charge trapping and interface states in hydrogen annealed HfO2–Si structures
Y.V. Gomeniuk, A.N. Nazarov, Ya.N. Vovk, V.S. Lysenko, Yi Lu, O. Buiu, S. Hall, R.J. Potter, P. ChalkerVolume:
47
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.microrel.2007.01.025
File:
PDF, 261 KB
english, 2007