Chemical vapor deposition of tantalum nitride films for metal gate application using TBTDET and novel single-source MOCVD precursors
M. Lemberger, A. Baunemann, A.J. BauerVolume:
47
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.microrel.2007.01.032
File:
PDF, 578 KB
english, 2007