Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicle
Croes, K., Cannatá, G., Zhao, L., Tőkei, Zs.Volume:
48
Language:
english
Pages:
4
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2008.07.047
Date:
August, 2008
File:
PDF, 192 KB
english, 2008