Impact of interface state trap density on the performance characteristics of different III–V MOSFET architectures
B. Benbakhti, J.S. Ayubi-Moak, K. Kalna, D. Lin, G. Hellings, G. Brammertz, K. De Meyer, I. Thayne, A. AsenovVolume:
50
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.microrel.2009.11.017
File:
PDF, 730 KB
english, 2010