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Charge trapping versus buried oxide thickness for SIMOX structures
Lawrence, R.K., Ioannou, D.E., Hughes, H.L., McMarr, P.J., Mrstik, B.J.Volume:
42
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/23.489261
Date:
January, 1995
File:
PDF, 697 KB
english, 1995