Hydrogen, oxygen and hydroxyl on porous silicon surface: A...

Thin Solid Films 2014 / 11 Vol. 571

Hydrogen, oxygen and hydroxyl on porous silicon surface: A joint density-functional perturbation theory and infrared spectroscopy approach

Alfaro, Pedro, Palavicini, Alessio, Wang, Chumin
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Volume:
571
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.10.084
Date:
November, 2014
File:
PDF, 950 KB
english, 2014
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