Submicron gate Si3N4/AlGaN/GaN-metal-insulator-semiconductor heterostructure field-effect transistors
Adivarahan, V., Gaevski, M., Sun, W.H., Fatima, H., Koudymov, A., Saygi, S., Simin, G., Yang, J., Khan, M.A., Tarakji, A., Shur, M.S., Gaska, R.Volume:
24
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2003.816574
Date:
September, 2003
File:
PDF, 250 KB
english, 2003