The effect of ion implantation energy and dosage on the microstructure of the ion beam synthesized FeSi2 in Si
Y.T. Chong, Q. Li, C.F. Chow, N. Ke, W.Y. Cheung, S.P. Wong, K.P. HomewoodVolume:
124-125
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.mseb.2005.08.042
File:
PDF, 252 KB
english, 2005