Submicron confinement effect on electrical activation of B implanted in Si
E. Bruno, S. Mirabella, G. Impellizzeri, F. Priolo, F. Giannazzo, V. Raineri, E. NapolitaniVolume:
124-125
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.mseb.2005.08.064
File:
PDF, 125 KB
english, 2005