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Growth and characterization of strain-relaxed SiGe buffer layers on Si(0 0 1) substrates with pure-edge misfit dislocations
Noriyuki Taoka, Akira Sakai, Tomohiro Egawa, Osamu Nakatsuka, Shigeaki Zaima, Yukio YasudaVolume:
8
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.mssp.2004.09.057
File:
PDF, 318 KB
english, 2005