Low-temperature molecular beam epitaxy of Ge on Si
J.P. Leitão, A. Fonseca, N.A. Sobolev, M.C. Carmo, N. Franco, A.D. Sequeira, T.M. Burbaev, V.A. Kurbatov, M.M. Rzaev, A.O. Pogosov, N.N. Sibeldin, V.A. Tsvetkov, H. Lichtenberger, F. SchäfflerVolume:
8
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.mssp.2004.09.089
File:
PDF, 389 KB
english, 2005