![](/img/cover-not-exists.png)
Low-temperature conductance measurements of surface states in HfO2–Si structures with different gate materials
Y. Gomeniuk, A. Nazarov, Ya. Vovk, Yi Lu, O. Buiu, S. Hall, J.K. Efavi, M.C. LemmeVolume:
9
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.mssp.2006.10.014
File:
PDF, 178 KB
english, 2006