Hafnium oxide thin films deposited by high pressure...

Hafnium oxide thin films deposited by high pressure reactive sputtering in atmosphere formed with different Ar/O2 ratios

M. Toledano-Luque, E. San Andrés, J. Olea, A. del Prado, I. Mártil, W. Bohne, J. Röhrich, E. Strub
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
9
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.mssp.2006.10.018
File:
PDF, 240 KB
english, 2006
Conversion to is in progress
Conversion to is failed