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Hafnium oxide thin films deposited by high pressure reactive sputtering in atmosphere formed with different Ar/O2 ratios
M. Toledano-Luque, E. San Andrés, J. Olea, A. del Prado, I. Mártil, W. Bohne, J. Röhrich, E. StrubVolume:
9
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.mssp.2006.10.018
File:
PDF, 240 KB
english, 2006