Structure analysis of the system Hafnium/Silicon by means of X-ray photoelectron spectroscopy and X-ray photoelectron diffraction (XPD)
C.R. Flüchter, A. de Siervo, D. Weier, M. Schürmann, U. Berges, S. Dreiner, M.F. Carazzolle, R. Landers, G.G. Kleiman, C. WestphalVolume:
9
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.mssp.2006.10.022
File:
PDF, 539 KB
english, 2006