Photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) studies on the system hafnium silicide and hafnium oxide on Si(1 0 0)
D. Weier, C. Flüchter, A. de Siervo, M. Schürmann, S. Dreiner, U. Berges, M.F. Carazzolle, A. Pancotti, R. Landers, G.G. Kleiman, C. WestphalVolume:
9
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.mssp.2006.10.023
File:
PDF, 473 KB
english, 2006