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Electrical and structural characterization of PLD grown CeO2–HfO2 laminated high-k gate dielectrics
K. Karakaya, B. Barcones, Z.M. Rittersma, J.G.M. van Berkum, M.A. Verheijen, G. Rijnders, D.H.A. BlankVolume:
9
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.mssp.2006.10.024
File:
PDF, 450 KB
english, 2006